解像度: 1.7→29.617 Å / Num. obs: 49360 / % possible obs: 99.6 % / Observed criterion σ(I): -3 / 冗長度: 20.28 % / Biso Wilson estimate: 23.322 Å2 / Rmerge(I) obs: 0.11 / Net I/σ(I): 13.56
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
1.7-1.76
1.292
1.79
72693
8745
1
98.3
1.76-1.83
1.028
2.8
97236
8912
1
99.6
1.83-1.91
0.731
4
98242
8647
1
99.7
1.91-2.02
0.469
6
112416
9826
1
99.6
2.02-2.14
0.295
8.9
97340
8483
1
99.8
2.14-2.31
0.21
11.8
106846
9267
1
99.9
2.31-2.54
0.157
15.1
102007
8824
1
99.9
2.54-2.9
0.111
20.1
102780
8867
1
99.9
2.9-3.66
0.073
28.5
106156
9127
1
99.9
3.66-29.62
0.058
36
105151
9063
1
99.6
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.5.0053
精密化
PHENIX
精密化
SHELX
位相決定
MolProbity
3beta29
モデル構築
XSCALE
データスケーリング
PDB_EXTRACT
3.006
データ抽出
XDS
データ削減
SHELXD
位相決定
autoSHARP
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 1.7→29.617 Å / Cor.coef. Fo:Fc: 0.973 / Cor.coef. Fo:Fc free: 0.969 / Occupancy max: 1 / Occupancy min: 0.3 / SU B: 3.394 / SU ML: 0.049 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.081 / ESU R Free: 0.078 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 3. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 4. PLP IS COVALENTLY ATTACHED TO LYS187 (LLP). RESIDUAL DENSITY SUGGESTS ADDITIONAL MOIETY MAY BE ATTACHED TO THE C4A ATOM OF PLP. THESE DENSITIES ARE MODELED AS AN UNKNOWN LIGAND (UNL). 5. GLYCEROL MODELED ARE PRESENT IN CRYO CONDITION.
Rfactor
反射数
%反射
Selection details
Rfree
0.167
2495
5.1 %
RANDOM
Rwork
0.147
-
-
-
obs
0.148
49180
99.68 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK