解像度: 2.33→2.41 Å / 冗長度: 4.1 % / Rmerge(I) obs: 0.279 / Mean I/σ(I) obs: 5.5 / Rsym value: 0.27 / % possible all: 100
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解析
ソフトウェア
名称
バージョン
分類
HKL-2000
データ収集
SOLVE
位相決定
REFMAC
5.2.0019
精密化
HKL-2000
データ削減
HKL-2000
データスケーリング
精密化
構造決定の手法: 多波長異常分散 / 解像度: 2.34→29.35 Å / Cor.coef. Fo:Fc: 0.944 / Cor.coef. Fo:Fc free: 0.923 / SU B: 14.237 / SU ML: 0.172 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R: 0.352 / ESU R Free: 0.24 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: Due to a feature in the refinement program, the structure was refined with OXT on one or more residues that are not the terminal residues of the sequence. In all these instances the OXT was ...詳細: Due to a feature in the refinement program, the structure was refined with OXT on one or more residues that are not the terminal residues of the sequence. In all these instances the OXT was changed to N of the next residue
Rfactor
反射数
%反射
Selection details
Rfree
0.24556
3603
5.1 %
RANDOM
Rwork
0.20709
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obs
0.20899
67497
98.78 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: BABINET MODEL WITH MASK