温度: 277 K / 手法: microbatch technique under oil / pH: 8.5 詳細: 0.085 M TRIS HCl (pH 8.5), 25.5% w/v PEG4000 15% glycerol, microbatch technique under oil, temperature 277K
タイプ: MAR CCD 165 mm / 検出器: CCD / 日付: 2008 詳細: Slits: Variable vertical and horizontal slits. Monochromator: Monochromator system consisting of a horizontally deflecting and focusing crystal preceded by a vertically focusing mirror. ...詳細: Slits: Variable vertical and horizontal slits. Monochromator: Monochromator system consisting of a horizontally deflecting and focusing crystal preceded by a vertically focusing mirror. Distance from monochromator to sample is variable between 2.5 and 4.5 m. Distance from the monochromator to source is ~10.5 m.
放射
モノクロメーター: Monochromator system consisting of a horizontally deflecting and focusing crystal preceded by a vertically focusing mirror. Distance from monochromator to sample is variable ...モノクロメーター: Monochromator system consisting of a horizontally deflecting and focusing crystal preceded by a vertically focusing mirror. Distance from monochromator to sample is variable between 2.5 and 4.5 m. Distance from the monochromator to source is ~10.5 m. プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.9797 Å / 相対比: 1
反射
解像度: 1.55→30 Å / Num. obs: 57244 / % possible obs: 97.8 % / 冗長度: 5.7 % / Rmerge(I) obs: 0.066 / Net I/σ(I): 23.8
反射 シェル
解像度: 1.55→1.61 Å / 冗長度: 3.1 % / Rmerge(I) obs: 0.418 / Mean I/σ(I) obs: 2.2 / Num. unique all: 3603 / % possible all: 81.6
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解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.2.0019
精密化
MAR345dtb
データ収集
HKL-2000
データ削減
HKL-2000
データスケーリング
SOLVE
位相決定
精密化
構造決定の手法: 単波長異常分散 / 解像度: 1.55→30 Å / Cor.coef. Fo:Fc: 0.961 / Cor.coef. Fo:Fc free: 0.946 / SU B: 2.679 / SU ML: 0.053 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R: 0.086 / ESU R Free: 0.087 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. FOR STRUCTURE DETERMINATION, AUTHORS STATE THAT THE INITIAL MODEL IS SOLVED BY USING ANOMALOUS DATA ON A CRYSTAL DIFFERENT FROM WHAT WAS ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. FOR STRUCTURE DETERMINATION, AUTHORS STATE THAT THE INITIAL MODEL IS SOLVED BY USING ANOMALOUS DATA ON A CRYSTAL DIFFERENT FROM WHAT WAS DESCRIBED IN REMARK 200. THE FINAL STRUCTURE WAS REFINED BY USING THE INITIAL MODEL AND THE DATA DESCRIBED IN REMARK 3 AND REMARK 200.
Rfactor
反射数
%反射
Selection details
Rfree
0.22577
3060
5.1 %
RANDOM
Rwork
0.19355
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obs
0.19518
57244
98.37 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK