Group: Atomic model / Database references ...Atomic model / Database references / Derived calculations / Non-polymer description / Other / Version format compliance
SHEET DETERMINATION METHOD: DSSP THE SHEETS PRESENTED AS "AD" IN EACH CHAIN ON SHEET RECORDS BELOW ... SHEET DETERMINATION METHOD: DSSP THE SHEETS PRESENTED AS "AD" IN EACH CHAIN ON SHEET RECORDS BELOW IS ACTUALLY AN 8-STRANDED BARREL THIS IS REPRESENTED BY A 9-STRANDED SHEET IN WHICH THE FIRST AND LAST STRANDS ARE IDENTICAL.
ENGINEERED RESIDUE IN CHAIN A, GLN 103 TO HIS ENGINEERED RESIDUE IN CHAIN A, THR 127 TO VAL ...ENGINEERED RESIDUE IN CHAIN A, GLN 103 TO HIS ENGINEERED RESIDUE IN CHAIN A, THR 127 TO VAL ENGINEERED RESIDUE IN CHAIN A, LYS 153 TO ALA ENGINEERED RESIDUE IN CHAIN A, LYS 164 TO ALA ENGINEERED RESIDUE IN CHAIN A, ARG 191 TO TYR ENGINEERED RESIDUE IN CHAIN A, GLY 235 TO PRO ENGINEERED RESIDUE IN CHAIN A, ASN 366 TO PHE ENGINEERED RESIDUE IN CHAIN A, GLU 393 TO SER
Has protein modification
Y
配列の詳細
SEQUENCE IN DATABASE IS SEQUENCE 2 FROM PATENT US 6815192, WHICH IS FOR A XYLOGLUCANASE-BETA- ...SEQUENCE IN DATABASE IS SEQUENCE 2 FROM PATENT US 6815192, WHICH IS FOR A XYLOGLUCANASE-BETA-MANNANASE (CEL44C-MAN26A) AND THIS STRUCTURE IS FOR THE XYLOGLUCANASE PORTION.THE CONFLICTS ARE NOT MUTATIONS INTRODUCED BY NOVOZYMES (PATENTED SEQUENCE 6815192, GENBANK AAW12876.1). THIS SEQUENCE IS PUBLISHED (VIA THE PATENT, AND GENBANK AAW12876.1). THERE ARE OFTEN SMALL DIFFERENCES BETWEEN DIFFERENT STRAINS OF THE SAME ORGANISM.
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.7 Å3/Da / 溶媒含有率: 55 % / 解説: NONE
結晶化
詳細: 27% (W/V) PEG 3350, 0.2 M LITHIUM SULPHATE, 0.1 M BIS TRIS PH 6.5.
解像度: 1.7→41.76 Å / Cor.coef. Fo:Fc: 0.963 / Cor.coef. Fo:Fc free: 0.952 / SU B: 1.501 / SU ML: 0.05 / 交差検証法: THROUGHOUT / ESU R: 0.089 / ESU R Free: 0.088 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. RESIDUES 1-7 AND 519-524 ARE DISORDERED. THERE IS UNMODELLED DENSITY NEXT TO THE LIGAND IN THE PLUS 1 SUBSITE AND THE PLUS 5 SUBSITE.
Rfactor
反射数
%反射
Selection details
Rfree
0.18418
3384
5 %
RANDOM
Rwork
0.15683
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obs
0.15818
63732
95.2 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK