ジャーナル: J.Mol.Biol. / 年: 2008 タイトル: A New Member of the Alkaline Phosphatase Superfamily with a Formylglycine Nucleophile: Structural and Kinetic Characterisation of a Phosphonate Monoester Hydrolase/Phosphodiesterase ...タイトル: A New Member of the Alkaline Phosphatase Superfamily with a Formylglycine Nucleophile: Structural and Kinetic Characterisation of a Phosphonate Monoester Hydrolase/Phosphodiesterase from Rhizobium Leguminosarum. 著者: Jonas, S. / Van Loo, B. / Hyvonen, M. / Hollfelder, F.
MANGANESE (II) ION (MN): TYPE OF METAL ION AND OCCUPANCY WERE ASSIGNED ON THE BASIS OF MICROPIXE ...MANGANESE (II) ION (MN): TYPE OF METAL ION AND OCCUPANCY WERE ASSIGNED ON THE BASIS OF MICROPIXE DATA AND VALENCE BOND CALCULATIONS CALCIUM ION (CA): TYPE OF METAL ION AND OCCUPANCY WERE ASSIGNED ON THE BASIS OF MICROPIXE DATA AND VALENCE BOND CALCULATIONS
配列の詳細
RESIDUES 1-29 IN THE SEQUENCE ORIGINATE FROM A STREP-TAG AND A LINKER, THE ENZYME SEQUENCE STARTS ...RESIDUES 1-29 IN THE SEQUENCE ORIGINATE FROM A STREP-TAG AND A LINKER, THE ENZYME SEQUENCE STARTS WITH RESIDUE MET30 RESIDUE 57 IS A CASE OF MICROHETEROGENEITY WHERE MORE THAN ONE IDENTITY IS OBSERVED FOR A PARTICULAR RESIDUE NUMBER. AT POSITION 57 OF THE PROTEIN CHAIN A, BOTH DDZ AND CYS ARE PRESENT AT 0.60 AND 0.40 OCCUPANCIES RESPECTIVELY.
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.9537 Å / 相対比: 1
反射
解像度: 1.42→44.63 Å / Num. obs: 96695 / % possible obs: 98.9 % / Observed criterion σ(I): -3 / 冗長度: 4.7 % / Rmerge(I) obs: 0.06 / Net I/σ(I): 15.7
反射 シェル
解像度: 1.42→1.51 Å / 冗長度: 3.7 % / Rmerge(I) obs: 0.46 / Mean I/σ(I) obs: 2.83 / % possible all: 93.5
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解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.4.0069
精密化
XDS
データ削減
XSCALE
データスケーリング
AMoRE
位相決定
精密化
構造決定の手法: 分子置換 / 解像度: 1.42→44.63 Å / Cor.coef. Fo:Fc: 0.974 / Cor.coef. Fo:Fc free: 0.966 / SU B: 1.42 / SU ML: 0.051 / 交差検証法: THROUGHOUT / ESU R: 0.058 / ESU R Free: 0.06 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.182
4891
5.1 %
RANDOM
Rwork
0.156
-
-
-
obs
0.157
91803
98.9 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK