Component-ID: 1 / Ens-ID: 1 / Beg auth comp-ID: GLY / Beg label comp-ID: GLY / End auth comp-ID: SER / End label comp-ID: SER / Refine code: 5 / Auth seq-ID: 1 - 116 / Label seq-ID: 1 - 116
Dom-ID
Auth asym-ID
Label asym-ID
1
A
A
2
B
C
詳細
The biological assembly of these proteins is one activin A dimer in complex with 2 follistatin 315 molecules, which compose the activin:follistatin 315 complex. We observe one complex in the asymmetric unit.
AUTHOR STATE THE FOLLOWING IN THE PUBLICATION: ON ONE FOLLISTATIN MOLECULE (CHAIN C AND ITS ...AUTHOR STATE THE FOLLOWING IN THE PUBLICATION: ON ONE FOLLISTATIN MOLECULE (CHAIN C AND ITS SYMMETRICALLY EQUIVALENT MOLECULES), ELECTRON DENSITY COULD BE SEEN FOR RESIDUES 289-299. ON THE SECOND FOLLISTATIN MOLECULE(CHAIN D AND ITS SYMMETRICALLY EQUIVALENT MOLECULES), CONTINUOUS ELECTRON DENSITY ALLOWED FOR THE BUILDING OF MAIN-CHAIN ATOMS OF 10 RESIDUES. SIDE CHAINS FOR THESE RESIDUES COULD NOT BE UNAMBIGUOUSLY MODELED, PREVENTING IDENTIFICATION OF THIS SEQUENCE IN THE C-TERMINAL EXTENSION. HOWEVER, BASED ON THE SYMMETRY OF THE TWO FOLLISTATIN MOLECULES, THIS STRETCH LIKELY CONSISTS OF RESIDUES 295-304, REPRESENTING THE MAJORITY OF THE CHARGED AMINO ACIDS IN THE C-TERMINAL EXTENSION.
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.53 Å3/Da / 溶媒含有率: 51.47 %
結晶化
温度: 298 K / 手法: 蒸気拡散法, ハンギングドロップ法 / pH: 6.5 詳細: 20-23% PEG 1000, 200mM MgCl2, 3% EtOH, 20mM Trimethyl-amine HCl, pH 6.5, VAPOR DIFFUSION, HANGING DROP, temperature 298 K
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 1 Å / 相対比: 1
Reflection
冗長度: 7.2 % / Av σ(I) over netI: 4 / 数: 100464 / Rmerge(I) obs: 0.16 / Rsym value: 0.16 / D res high: 3.4 Å / D res low: 34.344 Å / Num. obs: 13978 / % possible obs: 99.7
解像度: 3.4→31.01 Å / Cor.coef. Fo:Fc: 0.913 / Cor.coef. Fo:Fc free: 0.811 / SU B: 90.513 / SU ML: 0.667 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R Free: 0.733 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.324
283
2 %
RANDOM
Rwork
0.223
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-
-
obs
0.225
13955
99.69 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK