SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN ... SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN THE SHEET RECORDS BELOW, TWO SHEETS ARE DEFINED.
分子量: 24189.033 Da / 分子数: 1 / 断片: ANTIGEN-BINDING FRAGMENT FAB, HEAVY CHAIN / 由来タイプ: 天然 / 詳細: MONOCLONAL ANTIBODY ISOTYPE IS IGG1, KAPPA. / 由来: (天然) MUS MUSCULUS (ハツカネズミ) / 株: BALB/C
構成要素の詳細
ENGINEERED RESIDUE IN CHAIN A, ASN 162 TO LYS ENGINEERED RESIDUE IN CHAIN A, THR 288 TO VAL ...ENGINEERED RESIDUE IN CHAIN A, ASN 162 TO LYS ENGINEERED RESIDUE IN CHAIN A, THR 288 TO VAL ENGINEERED RESIDUE IN CHAIN A, SER 373 TO ASP ENGINEERED RESIDUE IN CHAIN A, ASN 422 TO SER ENGINEERED RESIDUE IN CHAIN A, SER 423 TO LYS ENGINEERED RESIDUE IN CHAIN A, ASN 499 TO GLN
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.2 Å3/Da / 溶媒含有率: 45 %
結晶化
温度: 290 K / pH: 4.6 詳細: CRYSTALLISATION TRIALS WERE CARRIED OUT WITH PFAMA1 ECTOPLASMIC CONSTRUCTION CORRESPONDING TO DOMAINS II-III. THE FAB FRAGMENT WAS INCUBATED IN SMALL STOICHIOMETRIC EXCESS WITH THE ...詳細: CRYSTALLISATION TRIALS WERE CARRIED OUT WITH PFAMA1 ECTOPLASMIC CONSTRUCTION CORRESPONDING TO DOMAINS II-III. THE FAB FRAGMENT WAS INCUBATED IN SMALL STOICHIOMETRIC EXCESS WITH THE RECOMBINANT PROTEIN (1.2:1) BEFORE ADDING CRYSTALLISATION BUFFERS. CRYSTALLISATION DROPS WERE PREPARED BY MIXING 0.8 MICROL OF PROTEIN WITH 0.8 MICROL OF RESERVOIR BUFFER COMPRISING 12% PEG 6000 AND 0.1 M SODIUM ACETATE AT PH 4.6. THE FINAL PROTEIN CONCENTRATION WAS 3.2 MG/ML. CRYSTALS APPEARED AFTER 5 DAYS AT 17 DEGREE C.
解像度: 2.9→20 Å / Cor.coef. Fo:Fc: 0.931 / Cor.coef. Fo:Fc free: 0.879 / SU B: 17.716 / SU ML: 0.328 / 交差検証法: THROUGHOUT / ESU R: 0.948 / ESU R Free: 0.39 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. FAB LIGHT AND HEAVY CHAIN ARE NUMBERED ACCORDING TO THE KABAT CONVENTION. ANTIGENS RESIDUES A303 TO A477 AND A513 TO A545 ARE DISORDERED IN THE CRYSTAL STRUCTURE
Rfactor
反射数
%反射
Selection details
Rfree
0.278
847
5 %
RANDOM
Rwork
0.212
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obs
0.215
16037
99.8 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK