SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN ... SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN THE SHEET RECORDS BELOW, TWO SHEETS ARE DEFINED.
ENGINEERED RESIDUE IN CHAIN D, SER 136 TO ASN ENGINEERED RESIDUE IN CHAIN D, ASN 184 TO ASP ...ENGINEERED RESIDUE IN CHAIN D, SER 136 TO ASN ENGINEERED RESIDUE IN CHAIN D, ASN 184 TO ASP ENGINEERED RESIDUE IN CHAIN D, ASN 399 TO GLU
Has protein modification
Y
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 3.61 Å3/Da / 溶媒含有率: 65.63 %
結晶化
pH: 4.4 詳細: PVAMA1 AND FAB-F8.12.19 WERE MIXED IN A 1:1 STOICHIOMETRIC RATIO AND LEFT TO INCUBATE FOR 4 HOURS AT ROOM TEMPERATURE TO FORM THE ANTIBODY-ANTIGEN COMPLEX BEFORE MIXING WITH CRYSTALLISATION ...詳細: PVAMA1 AND FAB-F8.12.19 WERE MIXED IN A 1:1 STOICHIOMETRIC RATIO AND LEFT TO INCUBATE FOR 4 HOURS AT ROOM TEMPERATURE TO FORM THE ANTIBODY-ANTIGEN COMPLEX BEFORE MIXING WITH CRYSTALLISATION SCREENING BUFFERS. CRYSTALS USED FOR DIFFRACTION MEASUREMENTS WERE OBTAINED AS FOLLOWS. THE CRYSTALLISATION BUFFER IN THE RESERVOIR COMPRISED 10% PEG 6000 AND 0.1 M SODIUM ACETATE BUFFERED TO PH 4.4. THE CRYSTALLISATION DROP WAS PREPARED BY ADDING 0.8 MICROLITRES OF THE CRYSTALLISATION BUFFER TO 0.8 MICROLITRES OF THE PVAMA1-FAB COMPLEX, GIVING A FINAL PROTEIN CONCENTRATION OF 3.9 MG/ML.
解像度: 2.5→20 Å / Cor.coef. Fo:Fc: 0.948 / Cor.coef. Fo:Fc free: 0.911 / SU B: 7.612 / SU ML: 0.168 / 交差検証法: THROUGHOUT / ESU R: 0.297 / ESU R Free: 0.24 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. FAB LIGHT AND HEAVY CHAINS ARE NUMBERED ACCORDING TO THE KABAT CONVENTION. ANTIGEN RESIDUES D43 TO D420 AND RESIDUES D455 TO D487 ARE ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. FAB LIGHT AND HEAVY CHAINS ARE NUMBERED ACCORDING TO THE KABAT CONVENTION. ANTIGEN RESIDUES D43 TO D420 AND RESIDUES D455 TO D487 ARE DISSORDERED IN THE CRYSTAL STRUCTURE
Rfactor
反射数
%反射
Selection details
Rfree
0.241
1335
5.1 %
RANDOM
Rwork
0.187
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obs
0.19
24858
98.7 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK