SEQUENCE THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG: MGSDKIHHHHHHENLYFQG. THE TAG WAS ...SEQUENCE THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG: MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE.
DATA FROM A MONOCLINIC C2 CRYSTAL FORM CONTAINING SE-MET WAS USED FOR THE MAD PHASING EXPERIMENTS AND DETERMINATION OF THE STRUCTURE AT A RESOLUTION OF 2.0 ANGSTROMS. THIS 2.0 ANGSTROM MAD STRUCTURE WAS USED AS A MOLECULAR REPLACEMENT MODEL TO DETERMINE THE STRUCTURE AT AN ENHANCED RESOLUTION OF 1.87 ANGSTROMS IN THE I222 SPACEGROUP.
2
結晶化
温度 (K)
Crystal-ID
手法
pH
詳細
277
1
蒸気拡散法, シッティングドロップ法, nanodrop
6
10.0% PEG-8000, 0.2M Zn(OAc)2, 0.1M MES pH 6.0, VAPOR DIFFUSION,SITTING DROP,NANODROP, temperature 277K
277
2
蒸気拡散法, シッティングドロップ法, nanodrop
6
0.2M MgNO3, 20.0% PEG-3350, No Buffer pH 5.8, pH 6.0, VAPOR DIFFUSION,SITTING DROP,NANODROP, temperature 277K
-
データ収集
回折
ID
平均測定温度 (K)
Crystal-ID
1
100
1
2
100
2
放射光源
由来
サイト
ビームライン
ID
波長 (Å)
シンクロトロン
SSRL
BL11-1
1
1.000001
シンクロトロン
SSRL
BL9-2
2
0.97918, 0.91837, 0.97903
検出器
タイプ
ID
検出器
日付
詳細
ADSC QUANTUM 315
1
CCD
2006年3月19日
Flatmirror (verticalfocusing)
MARMOSAIC 325 mm CCD
2
CCD
2006年3月12日
Flatcollimatingmirror, toroidfocusingmirror
放射
ID
プロトコル
単色(M)・ラウエ(L)
散乱光タイプ
Wavelength-ID
モノクロメーター
1
SINGLEWAVELENGTH
M
x-ray
1
2
MAD
M
x-ray
2
Doublecrystalmonochromator
放射波長
ID
波長 (Å)
相対比
1
1.000001
1
2
0.97918
1
3
0.91837
1
4
0.97903
1
反射
解像度: 1.87→30.08 Å / Num. obs: 24246 / % possible obs: 99.5 % / 冗長度: 4.05 % / Biso Wilson estimate: 28.07 Å2 / Rmerge(I) obs: 0.114 / Net I/σ(I): 8.38
反射 シェル
解像度 (Å)
% possible obs (%)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Diffraction-ID
% possible all
1.87-1.94
99.5
0.698
1.27
9461
1,2
99.5
1.94-2.01
99.7
0.528
1.67
8346
1,2
2.01-2.11
99.5
0.401
2.23
10016
1,2
2.11-2.22
99.7
0.279
3.12
9164
1,2
2.22-2.36
99.8
0.22
3.92
9319
1,2
2.36-2.54
99.6
0.161
5.18
9107
1,2
2.54-2.79
99.8
0.118
6.94
9212
1,2
2.79-3.19
99.6
0.075
10.02
9283
1,2
3.19-4.02
99.1
0.04
16.86
9349
1,2
4.02-30.1
98.4
0.024
25.78
9441
1,2
-
位相決定
位相決定
手法: 多波長異常分散, 分子置換
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.2.0005
精密化
XSCALE
データスケーリング
PDB_EXTRACT
1.701
データ抽出
XDS
データ削減
SHELXD
位相決定
autoSHARP
位相決定
PHASER
位相決定
精密化
構造決定の手法: 多波長異常分散, 分子置換 / 解像度: 1.87→30.08 Å / Cor.coef. Fo:Fc: 0.953 / Cor.coef. Fo:Fc free: 0.941 / SU B: 5.854 / SU ML: 0.089 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.122 / ESU R Free: 0.115 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: 1). HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2). A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN ...詳細: 1). HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2). A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 TO ACCOUNT FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 3). GLYCEROL, ACETATE, AND ZINC CATIONS ARE MODELED BASED ON THE CRYSTALLIZATION CONDITIONS. 4). X-RAY ANOMALOUS SCATTERING MEASUREMENTS INDICATE ZINC CATIONS ARE COORDINATED TO HIS AND CYS SIDECHAIN ATOMS. 5). ATOM RECORD CONTAINS RESIDUAL B FACTORS 6). ELECTRON DENSITY INDICATED THAT THE SIDECHAIN SULFUR ATOM OF OF CYS 61 NEAR THE PUTATIVE ACTIVE SITE IS IN COVALENT BONDING DISTANCE OF AN UNKNOWN MOLECULE, AND AN UNKNOWN LIGAND (UNL) WAS MODELED AT THIS POSITION.
Rfactor
反射数
%反射
Selection details
Rfree
0.217
1229
5.1 %
RANDOM
Rwork
0.19
-
-
-
all
0.191
-
-
-
obs
0.19109
24246
99.66 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: BABINET MODEL WITH MASK
原子変位パラメータ
Biso mean: 31.123 Å2
Baniso -1
Baniso -2
Baniso -3
1-
0.56 Å2
0 Å2
0 Å2
2-
-
0.9 Å2
0 Å2
3-
-
-
-1.46 Å2
精密化ステップ
サイクル: LAST / 解像度: 1.87→30.08 Å
タンパク質
核酸
リガンド
溶媒
全体
原子数
1582
0
68
129
1779
拘束条件
Refine-ID
タイプ
Dev ideal
Dev ideal target
数
X-RAY DIFFRACTION
r_bond_refined_d
0.014
0.022
1710
X-RAY DIFFRACTION
r_bond_other_d
0.003
0.02
1533
X-RAY DIFFRACTION
r_angle_refined_deg
1.644
1.989
2279
X-RAY DIFFRACTION
r_angle_other_deg
1.131
3
3553
X-RAY DIFFRACTION
r_dihedral_angle_1_deg
3.609
5
207
X-RAY DIFFRACTION
r_dihedral_angle_2_deg
29.197
23.117
77
X-RAY DIFFRACTION
r_dihedral_angle_3_deg
10.225
15
272
X-RAY DIFFRACTION
r_dihedral_angle_4_deg
9.874
15
11
X-RAY DIFFRACTION
r_chiral_restr
0.097
0.2
225
X-RAY DIFFRACTION
r_gen_planes_refined
0.005
0.02
1906
X-RAY DIFFRACTION
r_gen_planes_other
0.002
0.02
367
X-RAY DIFFRACTION
r_nbd_refined
0.179
0.3
298
X-RAY DIFFRACTION
r_nbd_other
0.125
0.3
1452
X-RAY DIFFRACTION
r_nbtor_refined
0.177
0.5
804
X-RAY DIFFRACTION
r_nbtor_other
0.081
0.5
886
X-RAY DIFFRACTION
r_xyhbond_nbd_refined
0.153
0.5
165
X-RAY DIFFRACTION
r_metal_ion_refined
0.144
0.5
2
X-RAY DIFFRACTION
r_symmetry_vdw_refined
0.14
0.3
38
X-RAY DIFFRACTION
r_symmetry_vdw_other
0.141
0.3
111
X-RAY DIFFRACTION
r_symmetry_hbond_refined
0.22
0.5
43
X-RAY DIFFRACTION
r_symmetry_metal_ion_refined
0.09
0.5
1
X-RAY DIFFRACTION
r_mcbond_it
1.53
3
1075
X-RAY DIFFRACTION
r_mcbond_other
0.328
3
419
X-RAY DIFFRACTION
r_mcangle_it
2.323
5
1627
X-RAY DIFFRACTION
r_scbond_it
3.861
8
753
X-RAY DIFFRACTION
r_scangle_it
5.003
11
649
LS精密化 シェル
解像度: 1.87→1.919 Å / Total num. of bins used: 20
Rfactor
反射数
%反射
Rfree
0.27
77
-
Rwork
0.279
1671
-
obs
-
1748
99.77 %
精密化 TLS
手法: refined / Origin x: 33.842 Å / Origin y: 19.94 Å / Origin z: 4.083 Å