#1: ジャーナル: FEBS Lett. / 年: 2002 タイトル: Alternative arrangements of catalytic residues at the active sites of restriction enzymes. 著者: Tamulaitis, G. / Solonin, A.S. / Siksnys, V.
Group: Data collection / カテゴリ: chem_comp_atom / chem_comp_bond
Remark 300
BIOMOLECULE 1, 2 THIS ENTRY CONTAINS THE CRYSTALLOGRAPHIC ASYMMETRIC UNIT WHICH CONSISTS OF 8 ...BIOMOLECULE 1, 2 THIS ENTRY CONTAINS THE CRYSTALLOGRAPHIC ASYMMETRIC UNIT WHICH CONSISTS OF 8 CHAIN(S). SEE REMARK 350 FOR INFORMATION ON GENERATING THE BIOLOGICAL MOLECULE(S). UNDER PHYSIOLOGICAL CONDITIONS Ecl18KI ENDONUCLEASE EXISTS PREDOMINANTLY AS A DIMER (CHAINS AB OR CD), HOWEVER THERE IS SOME EVIDENCE THAT AT HIGH CONCENTRATIONS AND IN SOME CONDITIONS DIMERS MAY ASSOCIATE.
マシュー密度: 2.32 Å3/Da / 溶媒含有率: 47.06 % 解説: Data for refinement were collected at 1.05 A. MAD data were collected on a bromide soaked crystal (1.05, 0.900, 0.9198, 0.9200) and on a crystal of the selenomethionine variant (0.9792, 0.9795)
解像度: 1.7→40 Å / Num. all: 158490 / Num. obs: 158490 / % possible obs: 97.7 % / 冗長度: 3.3 % / Biso Wilson estimate: 31 Å2 / Rmerge(I) obs: 0.043 / Rsym value: 0.043 / Net I/σ(I): 31
反射 シェル
解像度: 1.7→1.72 Å / 冗長度: 3 % / Rmerge(I) obs: 0.34 / Mean I/σ(I) obs: 3.9 / Num. unique all: 5907 / Rsym value: 0.34 / % possible all: 92.6
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解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.2.0005
精密化
DENZO
データ削減
SCALEPACK
データスケーリング
SHELXD
位相決定
SHELXE
モデル構築
MLPHARE
位相決定
GETAX
位相決定
直接法
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 1.7→20 Å / Cor.coef. Fo:Fc: 0.959 / Cor.coef. Fo:Fc free: 0.943 / SU B: 4.763 / SU ML: 0.078 / TLS residual ADP flag: LIKELY RESIDUAL / Isotropic thermal model: TLS / 交差検証法: THROUGHOUT / ESU R: 0.121 / ESU R Free: 0.116 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: TLS refinement used. The identity of nucleotide 0 (zero) in chains F and H is uncertain (currently assigned as T). See the details in the primary citation.
Rfactor
反射数
%反射
Selection details
Rfree
0.236
7898
10 %
RANDOM
Rwork
0.207
-
-
-
all
0.208
157798
-
-
obs
0.208
157798
97.5 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK