SEQUENCE: THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS ...SEQUENCE: THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY A GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE.
解像度: 2.01→29.5 Å / Num. obs: 22815 / % possible obs: 85.9 % / 冗長度: 3.49 % / Rmerge(I) obs: 0.085 / Net I/σ(I): 11.06
反射 シェル
解像度 (Å)
% possible obs (%)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
2.01-2.08
46.8
0.398
1.97
2809
2077
1,2
2.08-2.17
57.7
0.37
2.47
5380
2852
1,2
2.17-2.26
83.8
0.307
3.2
7889
3527
1,2
2.26-2.38
88.4
0.344
3.96
11139
4049
1,2
2.38-2.53
92.5
0.339
5.06
14966
4299
1,2
2.53-2.73
95
0.273
6.77
18378
4408
1,2
2.73-3
97.7
0.212
9.73
24691
4409
1,2
3-3.43
98.6
0.119
15.98
31005
4504
1,2
3.43-4.32
99.8
0.08
21.69
31522
4583
1,2
4.32-29.5
99.4
0.057
28.35
31169
4610
1,2
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.2.0005
精密化
XSCALE
データスケーリング
PDB_EXTRACT
1.601
データ抽出
XDS
データ削減
SOLVE
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 2.01→29.5 Å / Cor.coef. Fo:Fc: 0.957 / Cor.coef. Fo:Fc free: 0.945 / SU B: 10.396 / SU ML: 0.138 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R: 0.195 / ESU R Free: 0.173 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1.HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS 2. THE PEPTIDE BOND BETWEEN ASP 166 AND ASP 167 NEAR THE PUTATIV ACTIVE SITE WAS MODELED IN THE CIS CONFORMATION 3.ELECTRON DENSITIES ...詳細: 1.HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS 2. THE PEPTIDE BOND BETWEEN ASP 166 AND ASP 167 NEAR THE PUTATIV ACTIVE SITE WAS MODELED IN THE CIS CONFORMATION 3.ELECTRON DENSITIES BETWEEN RESIDUE RANGES 109-119,198-202, AND 279-291 WERE DISORDERED; THEREFORE, THESE REGIONS WERE NOT MODELED. 4. THE ELECTRON DENSITY MAP SHOWS SUBSTANTIAL DIFFERENCE DENSITY THE VICINITY OF LYS 249.
Rfactor
反射数
%反射
Selection details
Rfree
0.24423
1177
5.2 %
RANDOM
Rwork
0.20277
-
-
-
all
0.205
-
-
-
obs
0.20478
21615
93.81 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK