SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN ... SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN THE SHEET RECORDS BELOW, TWO SHEETS ARE DEFINED.
ENGINEERED MUTATION IN CHAIN A, SER 178 TO ASN ENGINEERED MUTATION IN CHAIN A, ASN 226 TO ASP ...ENGINEERED MUTATION IN CHAIN A, SER 178 TO ASN ENGINEERED MUTATION IN CHAIN A, ASN 226 TO ASP ENGINEERED MUTATION IN CHAIN A, ASN 441 TO GLN
Has protein modification
Y
配列の詳細
SEQUENCE EXPRESSED COMPRISES RESIDUES 1 TO 445. MUTATIONS S136N, N184D AND N399Q HAVE BEEN ...SEQUENCE EXPRESSED COMPRISES RESIDUES 1 TO 445. MUTATIONS S136N, N184D AND N399Q HAVE BEEN INTRODUCED TO ELIMINATE POTENTIAL N-GLYCOSYLATION SITE.
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.2 Å3/Da / 溶媒含有率: 44 %
結晶化
pH: 7 詳細: THE CRYSTALLISATION MIXTURE CONSISTED OF 10-12% (W/V) PEG3350, 100-200MM IMIDAZOLE, PH 7.0, 5-10% (V/V) ISOPROPANOL, AND 1% (V/V) DMF OR 3% (V/V) T-BUTANOL. THE PROTEIN SOLUTION WAS DILUTED ...詳細: THE CRYSTALLISATION MIXTURE CONSISTED OF 10-12% (W/V) PEG3350, 100-200MM IMIDAZOLE, PH 7.0, 5-10% (V/V) ISOPROPANOL, AND 1% (V/V) DMF OR 3% (V/V) T-BUTANOL. THE PROTEIN SOLUTION WAS DILUTED BY 40 - 60% REMARK 280 WITH THE CRYSTALLISATION BUFFER, GIVING A FINAL REMARK 280 CONCENTRATION OF 4-6 MG. ML-1 IN SUSPENDED DROPS OF VOLUME REMARK 280 2 - 3 PERCENT.
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.933 Å / 相対比: 1
反射
解像度: 1.8→30 Å / Num. obs: 152093 / % possible obs: 99.2 % / Observed criterion σ(I): 0 / 冗長度: 3.7 % / Rmerge(I) obs: 0.06 / Net I/σ(I): 10.5
反射 シェル
解像度: 1.8→1.9 Å / Rmerge(I) obs: 0.74 / Mean I/σ(I) obs: 2 / % possible all: 97.3
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解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.2.0003
精密化
XDS
データ削減
XSCALE
データスケーリング
SHARP
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 1.8→19.34 Å / Cor.coef. Fo:Fc: 0.957 / Cor.coef. Fo:Fc free: 0.933 / SU B: 4.043 / SU ML: 0.122 / 交差検証法: THROUGHOUT / ESU R: 0.139 / ESU R Free: 0.141 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. THE FOLLOWING SEGMENTS WERE NOT MODELLED A171 TO 176, A204 TO A206, A210 TO A215, A297 TO A334, A403 TO A413, A476 TO A487.
Rfactor
反射数
%反射
Selection details
Rfree
0.269
2070
5.1 %
RANDOM
Rwork
0.219
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obs
0.222
38819
99.7 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK