positive regulation of sporulation resulting in formation of a cellular spore / chromosome segregation / 染色体 / negative regulation of DNA-templated transcription / protein-containing complex / DNA binding / identical protein binding 類似検索 - 分子機能
KorB DNA-binding domain / Single alpha-helices involved in coiled-coils or other helix-helix interfaces - #140 / KorB, C-terminal / Repressor KorB domain / KorB, C-terminal domain superfamily / KorB DNA-binding domain / KorB C-terminal beta-barrel domain / KorB domain / ParB/RepB/Spo0J partition protein / ParB/Sulfiredoxin domain ...KorB DNA-binding domain / Single alpha-helices involved in coiled-coils or other helix-helix interfaces - #140 / KorB, C-terminal / Repressor KorB domain / KorB, C-terminal domain superfamily / KorB DNA-binding domain / KorB C-terminal beta-barrel domain / KorB domain / ParB/RepB/Spo0J partition protein / ParB/Sulfiredoxin domain / ParB/Sulfiredoxin / ParB-like nuclease domain / ParB/Sulfiredoxin superfamily / Transcriptional repressor, C-terminal / Single alpha-helices involved in coiled-coils or other helix-helix interfaces / Helix non-globular / Special / Arc Repressor Mutant, subunit A / Orthogonal Bundle / Mainly Alpha 類似検索 - ドメイン・相同性
デオキシリボ核酸 / DNA (> 10) / Transcriptional repressor protein KorB 類似検索 - 構成要素
構造決定の手法: 多波長異常分散 / 解像度: 2.2→30 Å / Cor.coef. Fo:Fc: 0.958 / Cor.coef. Fo:Fc free: 0.937 / SU B: 5.591 / SU ML: 0.142 / 交差検証法: THROUGHOUT / ESU R: 0.216 / ESU R Free: 0.197 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. The DNA in the co-crystal has dual occupancy in the two complexes. There are certain water molecules showing close contact to one of the ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. The DNA in the co-crystal has dual occupancy in the two complexes. There are certain water molecules showing close contact to one of the strand. These water molecules form hydrogen bonds to the other overlaying stand and therefore are kept at occupancy 0.5.
Rfactor
反射数
%反射
Selection details
Rfree
0.25028
2911
5 %
RANDOM
Rwork
0.19481
-
-
-
obs
0.19759
54758
99.51 %
-
all
-
57947
-
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: BABINET MODEL WITH MASK