Component-ID: 1 / Ens-ID: 1 / Beg auth comp-ID: ALA / Beg label comp-ID: ALA / End auth comp-ID: PRO / End label comp-ID: PRO / Auth seq-ID: 2 - 208 / Label seq-ID: 1 - 207
Dom-ID
Auth asym-ID
Label asym-ID
1
A
A
2
B
B
NCSアンサンブル: (詳細: Local NCS retraints between domains: 1 2)
モノクロメーター: silicon 111 / プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.9184 Å / 相対比: 1
反射
解像度: 2.3→50 Å / Num. obs: 23740 / % possible obs: 100 % / Observed criterion σ(I): -3 / 冗長度: 12.9 % / Biso Wilson estimate: 41.4 Å2 / CC1/2: 0.996 / Rsym value: 0.276 / Net I/σ(I): 11.7
反射 シェル
解像度: 2.3→2.49 Å / 冗長度: 13.6 % / Mean I/σ(I) obs: 2 / Num. unique obs: 5002 / CC1/2: 0.537 / Rsym value: 1.549 / % possible all: 100
-
解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.8.0430 (refmacat0.4.105)
精密化
XDS
VERSIONJun30, 2024
データ削減
XSCALE
VERSIONJun30, 2024
データスケーリング
PHASER
2.8.3
位相決定
精密化
構造決定の手法: 分子置換 / 解像度: 2.3→48.254 Å / Cor.coef. Fo:Fc: 0.95 / Cor.coef. Fo:Fc free: 0.92 / SU B: 18.963 / SU ML: 0.205 / 交差検証法: THROUGHOUT / ESU R: 0.284 / ESU R Free: 0.226 / 詳細: Hydrogens have been added in their riding positions
Rfactor
反射数
%反射
Rfree
0.25
1248
5.259 %
Rwork
0.1997
22482
-
all
0.202
-
-
obs
-
23730
99.971 %
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK BULK SOLVENT
原子変位パラメータ
Biso mean: 45.518 Å2
Baniso -1
Baniso -2
Baniso -3
1-
1.02 Å2
0 Å2
0 Å2
2-
-
0.588 Å2
-0 Å2
3-
-
-
-1.608 Å2
精密化ステップ
サイクル: LAST / 解像度: 2.3→48.254 Å
タンパク質
核酸
リガンド
溶媒
全体
原子数
3180
0
108
53
3341
拘束条件
Refine-ID
タイプ
Dev ideal
Dev ideal target
数
X-RAY DIFFRACTION
r_bond_refined_d
0.008
0.012
3366
X-RAY DIFFRACTION
r_bond_other_d
0.001
0.016
3290
X-RAY DIFFRACTION
r_angle_refined_deg
1.747
1.817
4599
X-RAY DIFFRACTION
r_angle_other_deg
0.553
1.743
7569
X-RAY DIFFRACTION
r_dihedral_angle_1_deg
7.089
5
406
X-RAY DIFFRACTION
r_dihedral_angle_2_deg
9.737
5
22
X-RAY DIFFRACTION
r_dihedral_angle_other_2_deg
0.015
5
4
X-RAY DIFFRACTION
r_dihedral_angle_3_deg
15.552
10
561
X-RAY DIFFRACTION
r_dihedral_angle_6_deg
14.292
10
138
X-RAY DIFFRACTION
r_chiral_restr
0.076
0.2
556
X-RAY DIFFRACTION
r_gen_planes_refined
0.006
0.02
3807
X-RAY DIFFRACTION
r_gen_planes_other
0.001
0.02
697
X-RAY DIFFRACTION
r_nbd_refined
0.221
0.2
561
X-RAY DIFFRACTION
r_symmetry_nbd_other
0.184
0.2
2908
X-RAY DIFFRACTION
r_nbtor_refined
0.177
0.2
1586
X-RAY DIFFRACTION
r_symmetry_nbtor_other
0.085
0.2
1898
X-RAY DIFFRACTION
r_xyhbond_nbd_refined
0.199
0.2
65
X-RAY DIFFRACTION
r_symmetry_xyhbond_nbd_other
0.261
0.2
1
X-RAY DIFFRACTION
r_symmetry_nbd_refined
0.236
0.2
25
X-RAY DIFFRACTION
r_nbd_other
0.217
0.2
67
X-RAY DIFFRACTION
r_symmetry_xyhbond_nbd_refined
0.121
0.2
10
X-RAY DIFFRACTION
r_mcbond_it
3.495
3.308
1627
X-RAY DIFFRACTION
r_mcbond_other
3.494
3.31
1628
X-RAY DIFFRACTION
r_mcangle_it
5.479
5.931
2029
X-RAY DIFFRACTION
r_mcangle_other
5.478
5.932
2030
X-RAY DIFFRACTION
r_scbond_it
3.794
3.843
1739
X-RAY DIFFRACTION
r_scbond_other
3.793
3.843
1740
X-RAY DIFFRACTION
r_scangle_it
6.086
6.83
2569
X-RAY DIFFRACTION
r_scangle_other
6.085
6.83
2570
X-RAY DIFFRACTION
r_lrange_it
10.72
38.643
3472
X-RAY DIFFRACTION
r_lrange_other
10.68
38.671
3468
X-RAY DIFFRACTION
r_ncsr_local_group_1
0.101
0.05
5687
Refine LS restraints NCS
Ens-ID
Dom-ID
Auth asym-ID
Refine-ID
タイプ
Rms dev position (Å)
Weight position
1
1
A
X-RAY DIFFRACTION
Localncs
0.10064
0.05008
1
2
B
X-RAY DIFFRACTION
Localncs
0.10064
0.05008
LS精密化 シェル
Refine-ID: X-RAY DIFFRACTION / Total num. of bins used: 20