ソフトウェア | 名称 | バージョン | 分類 |
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PHENIX | (PHENIX.REFINE)精密化 | XDS | | データ削減 | XSCALE | | データスケーリング | PHENIX | | 位相決定 | |
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精密化 | 構造決定の手法: 単波長異常分散 開始モデル: NONE 解像度: 2.8→46.496 Å / SU ML: 0.37 / σ(F): 1.54 / 位相誤差: 22.6 / 立体化学のターゲット値: MLHL 詳細: RESIDUES A539-540, B539-542, C539- -542, C592-597, D539-542, E539-540, E596-597, F539-542, F596-597 AND G595-597 ARE DISORDERED
| Rfactor | 反射数 | %反射 |
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Rfree | 0.2477 | 1326 | 5 % |
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Rwork | 0.2121 | - | - |
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obs | 0.2138 | 26577 | 99.97 % |
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溶媒の処理 | 減衰半径: 0.86 Å / VDWプローブ半径: 1.1 Å / 溶媒モデル: FLAT BULK SOLVENT MODEL / Bsol: 57.165 Å2 / ksol: 0.328 e/Å3 |
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原子変位パラメータ | | Baniso -1 | Baniso -2 | Baniso -3 |
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1- | -1.6645 Å2 | 0 Å2 | 0 Å2 |
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2- | - | -1.6645 Å2 | 0 Å2 |
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3- | - | - | 3.3291 Å2 |
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精密化ステップ | サイクル: LAST / 解像度: 2.8→46.496 Å
| タンパク質 | 核酸 | リガンド | 溶媒 | 全体 |
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原子数 | 2935 | 0 | 2 | 4 | 2941 |
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拘束条件 | Refine-ID | タイプ | Dev ideal | 数 |
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X-RAY DIFFRACTION | f_bond_d0.007 | 2965 | X-RAY DIFFRACTION | f_angle_d1.017 | 3986 | X-RAY DIFFRACTION | f_dihedral_angle_d17.106 | 1176 | X-RAY DIFFRACTION | f_chiral_restr0.068 | 474 | X-RAY DIFFRACTION | f_plane_restr0.005 | 522 | | | | | |
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Refine LS restraints NCS | Ens-ID | Dom-ID | Auth asym-ID | 数 | Refine-ID | タイプ | Rms dev position (Å) |
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1 | 1 | A116 | X-RAY DIFFRACTION | POSITIONAL | 1 | 2 | B116 | X-RAY DIFFRACTION | POSITIONAL0.036 | 1 | 3 | C116 | X-RAY DIFFRACTION | POSITIONAL0.034 | 1 | 4 | D116 | X-RAY DIFFRACTION | POSITIONAL0.052 | 1 | 5 | E116 | X-RAY DIFFRACTION | POSITIONAL0.035 | 1 | 6 | F116 | X-RAY DIFFRACTION | POSITIONAL0.079 | 1 | 7 | G116 | X-RAY DIFFRACTION | POSITIONAL0.049 | 2 | 1 | A229 | X-RAY DIFFRACTION | POSITIONAL | 2 | 2 | B229 | X-RAY DIFFRACTION | POSITIONAL0.065 | 2 | 3 | C229 | X-RAY DIFFRACTION | POSITIONAL0.051 | 2 | 4 | D229 | X-RAY DIFFRACTION | POSITIONAL0.068 | 2 | 5 | E225 | X-RAY DIFFRACTION | POSITIONAL0.059 | 2 | 6 | F229 | X-RAY DIFFRACTION | POSITIONAL0.054 | 2 | 7 | G229 | X-RAY DIFFRACTION | POSITIONAL0.057 | | | | | | | | | | | | | | | | | | | | | | | | | | | | |
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LS精密化 シェル | 解像度 (Å) | Rfactor Rfree | Num. reflection Rfree | Rfactor Rwork | Num. reflection Rwork | Refine-ID | % reflection obs (%) |
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2.8-2.9121 | 0.3473 | 147 | 0.3161 | 2797 | X-RAY DIFFRACTION | 100 | 2.9121-3.0446 | 0.2887 | 145 | 0.3014 | 2799 | X-RAY DIFFRACTION | 100 | 3.0446-3.2051 | 0.2892 | 148 | 0.2427 | 2829 | X-RAY DIFFRACTION | 100 | 3.2051-3.4059 | 0.2729 | 147 | 0.2437 | 2789 | X-RAY DIFFRACTION | 100 | 3.4059-3.6688 | 0.2174 | 152 | 0.2134 | 2812 | X-RAY DIFFRACTION | 100 | 3.6688-4.0378 | 0.2317 | 147 | 0.2005 | 2811 | X-RAY DIFFRACTION | 100 | 4.0378-4.6216 | 0.2086 | 152 | 0.1659 | 2795 | X-RAY DIFFRACTION | 100 | 4.6216-5.8209 | 0.2267 | 143 | 0.2036 | 2809 | X-RAY DIFFRACTION | 100 | 5.8209-46.5025 | 0.2743 | 145 | 0.2087 | 2810 | X-RAY DIFFRACTION | 100 |
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精密化 TLS | 手法: refined / Origin x: 10.7833 Å / Origin y: -15.6619 Å / Origin z: -1.8839 Å
| 11 | 12 | 13 | 21 | 22 | 23 | 31 | 32 | 33 |
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T | 0.2666 Å2 | 0.0999 Å2 | 0.0671 Å2 | - | 0.2785 Å2 | -0.0165 Å2 | - | - | 0.2792 Å2 |
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L | 2.2015 °2 | 0.1679 °2 | 0.1662 °2 | - | 2.0082 °2 | 0.3685 °2 | - | - | 0.8437 °2 |
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S | -0.1066 Å ° | 0.049 Å ° | -0.1647 Å ° | 0.0649 Å ° | 0.0257 Å ° | -0.1747 Å ° | 0.1233 Å ° | 0.1197 Å ° | 0.0746 Å ° |
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精密化 TLSグループ | Selection details: ALL |
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