モノクロメーター: Si(111) / プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.97857 Å / 相対比: 1
反射
解像度: 1.7→50 Å / Num. obs: 32457 / % possible obs: 84.4 % / 冗長度: 11.1 % / Net I/σ(I): 24.3
反射 シェル
解像度: 1.7→1.79 Å / 冗長度: 10.4 % / Mean I/σ(I) obs: 6.6 / Num. unique all: 1002 / % possible all: 84.4
-
解析
ソフトウェア
名称
バージョン
分類
HKL-2000
データ収集
PHASES
位相決定
REFMAC
5.5.0110
精密化
HKL-2000
データ削減
精密化
構造決定の手法: 分子置換 / 解像度: 1.7→50 Å / Cor.coef. Fo:Fc: 0.963 / Cor.coef. Fo:Fc free: 0.954 / SU B: 3.88 / SU ML: 0.057 / 交差検証法: THROUGHOUT / ESU R Free: 0.089 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: (1) DATA WAS COLLECTED TO THE HIGHER RESOLUTION OF 1.59 A. HOWEVER, DATA BELOW 1.7 A HAD LOW COMPLETENESS (LESS THAN 55%), AND THE SIGNAL-TO-NOISE RATIO I/SIGMA(I) WAS SIGNIFICANTLY LOW (LESS ...詳細: (1) DATA WAS COLLECTED TO THE HIGHER RESOLUTION OF 1.59 A. HOWEVER, DATA BELOW 1.7 A HAD LOW COMPLETENESS (LESS THAN 55%), AND THE SIGNAL-TO-NOISE RATIO I/SIGMA(I) WAS SIGNIFICANTLY LOW (LESS THAN 1.5). THEREFORE THE DATA WAS SCALED TO 1.7 A. (2) HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.20535
1677
5.1 %
RANDOM
Rwork
0.17136
-
-
-
obs
0.17316
31184
95.09 %
-
all
-
34562
-
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK