THIS CONSTRUCT (RESIDUE 23-414) WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG ...THIS CONSTRUCT (RESIDUE 23-414) WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY A GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE.
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.32 Å3/Da / 溶媒含有率: 47.06 %
結晶化
温度: 293 K / 手法: 蒸気拡散法, シッティングドロップ法 / pH: 6.2 詳細: 20.0000% polyethylene glycol 3350, 0.2000M ammonium fluoride, No Buffer pH 6.2, NANODROP, VAPOR DIFFUSION, SITTING DROP, temperature 293K
解像度: 1.8→29.696 Å / Cor.coef. Fo:Fc: 0.962 / Cor.coef. Fo:Fc free: 0.947 / Occupancy max: 1 / Occupancy min: 0.3 / SU B: 5.77 / SU ML: 0.081 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.122 / ESU R Free: 0.116 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 3. ETHYLENE GLYCOL (EDO) MOLECULES AND CHLORIDE (CL) IONS FROM THE ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 3. ETHYLENE GLYCOL (EDO) MOLECULES AND CHLORIDE (CL) IONS FROM THE CRYSTALLIZATION/CRYOPROTECTION SOLUTION ARE MODELED.
Rfactor
反射数
%反射
Selection details
Rfree
0.207
3820
5 %
RANDOM
Rwork
0.173
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obs
0.175
76018
99.9 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: BABINET MODEL WITH MASK