REMARK 300 REMARK 300 REMARK: ANALYTICAL SIZE EXCLUSION CHROMATOGRAPHY WITH REMARK 300 STATIC LIGHT SCATTERING SUGGESTS THAT A TETRAMER IS A REMARK 300 SIGNIFICANT OLIGOMERIZATION STATE IN SOLUTION. HOWEVER, R REMARK 300 ANALYSIS OF THE CRYSTAL PACKING SUGGESTS THAT A DIMER REMARK 300 IS OLIGOMERIZATION STATE IN THE CRYSTAL. REMARK 300 REMARK 300 BIOMOLECULE: 1,2 REMARK 300 SEE REMARK 350 FOR THE AUTHOR PROVIDED AND/OR PROGRAM REMARK 300 GENERATED ASSEMBLY INFORMATION FOR THE STRUCTURE IN REMARK 300 THIS ENTRY. THE REMARK MAY ALSO PROVIDE INFORMATION ON REMARK 300 BURIED SURFACE AREA. REMARK 350 REMARK 350 BIOMOLECULE 1 REMARK 350 SOFTWARE DETERMINED QUATERNARY STRUCTURE: DIMERIC REMARK 350 SOFTWARE USED: PISA 1.18 REMARK 350 TOTAL BURIED SURFACE AREA FOR THE COMPLEX: 3280 A**2 REMARK 350 SURFACE AREA FOR THE COMPLEX: 16490 A**2 REMARK 350 GAIN IN SOLVENT FREE ENERGY: -20 KCAL/MOL REMARK 350 APPLY THE FOLLOWING TO CHAINS: C, D REMARK 350 BIOMT1 1 1.000000 0.000000 0.000000 0.00000 REMARK 350 BIOMT2 1 0.000000 1.000000 0.000000 0.00000 REMARK 350 BIOMT3 1 0.000000 0.000000 1.000000 0.00000 REMARK 350 REMARK 350 BIOMOLECULE 2 REMARK 350 SOFTWARE DETERMINED QUATERNARY STRUCTURE: DIMERIC REMARK 350 SOFTWARE USED: PISA 1.18 REMARK 350 TOTAL BURIED SURFACE AREA FOR THE COMPLEX: 3300 A**2 REMARK 350 SURFACE AREA FOR THE COMPLEX: 16620 A**2 REMARK 350 GAIN IN SOLVENT FREE ENERGY: -20 KCAL/MOL REMARK 350 APPLY THE FOLLOWING TO CHAINS: A, B REMARK 350 BIOMT1 1 1.000000 0.000000 0.000000 0.00000 REMARK 350 BIOMT2 1 0.000000 1.000000 0.000000 0.00000 REMARK 350 BIOMT3 1 0.000000 0.000000 1.000000 0.00000
SEQUENCE THIE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS ...SEQUENCE THIE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY A GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.91 Å3/Da / 溶媒含有率: 57.68 %
結晶化
温度: 277 K / 手法: 蒸気拡散法, シッティングドロップ法 / pH: 8.5 詳細: 0.3000M magnesium chloride, 16.0000% polyethylene glycol 8000, 0.1M TRIS pH 8.5, NANODROP, VAPOR DIFFUSION, SITTING DROP, temperature 277K
モノクロメーター: Single crystal Si(111) bent monochromator (horizontal focusing) プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.97809 Å / 相対比: 1
反射
解像度: 2.1→29.748 Å / Num. obs: 55159 / % possible obs: 98.6 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 32.23 Å2 / Rmerge(I) obs: 0.069 / Net I/σ(I): 8.74
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
2.1-2.17
0.585
1.4
19169
10025
1
98.1
2.17-2.26
0.453
1.9
21402
11144
1
98.7
2.26-2.36
0.332
2.5
20224
10513
1
99
2.36-2.49
0.265
3.1
21651
11224
1
99
2.49-2.64
0.192
4.2
20052
10371
1
99
2.64-2.85
0.139
5.7
21533
11118
1
98.9
2.85-3.13
0.092
8.3
20566
10595
1
98.7
3.13-3.59
0.051
14.1
21151
10871
1
98.7
3.59-4.51
0.032
21.1
20714
10618
1
98.4
4.51-29.748
0.026
25.1
21037
10751
1
97.7
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位相決定
位相決定
手法: 単波長異常分散
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解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.5.0053
精密化
PHENIX
精密化
SHELX
位相決定
MolProbity
3beta29
モデル構築
XSCALE
データスケーリング
PDB_EXTRACT
3.006
データ抽出
XDS
データ削減
SHELXD
位相決定
autoSHARP
位相決定
精密化
構造決定の手法: 単波長異常分散 / 解像度: 2.1→29.748 Å / Cor.coef. Fo:Fc: 0.952 / Cor.coef. Fo:Fc free: 0.927 / Occupancy max: 1 / Occupancy min: 0.5 / SU B: 9.532 / SU ML: 0.113 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.188 / ESU R Free: 0.168 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 3. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 3. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 4. MAGNESIUM FROM THE CRYSTALLIZATION SOLUTION AND 1,2-ETHANEDIOL (EDO) USED AS A CRYOPROTECTANT HAVE BEEN MODELED INTO THE STRUCTURE.
Rfactor
反射数
%反射
Selection details
Rfree
0.23
2802
5.1 %
RANDOM
Rwork
0.189
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-
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obs
0.191
55139
99.63 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK