THE SIDE CHAIN OF CYS156 IS EXTENDED TO FORM A PUTATIVE POLYSULFUR CHAIN. ONE SULFUR ATOM OF THE ...THE SIDE CHAIN OF CYS156 IS EXTENDED TO FORM A PUTATIVE POLYSULFUR CHAIN. ONE SULFUR ATOM OF THE CHAIN IS DESCRIBED AS LINKED TO THE CYS AND FORM A S-MERCAPTO-CYSTEINE, CSS. THE REST OF THE CHAIN TAKES THE FORM OF A CYCLOOCTASULFUR SPECIES PS9 IN SEVERAL MONOMERS AND MIGHT REPRESENT THE PRODUCT OF THE REACTION CATALYZED BY THE PROTEIN. H2S INDICATES A PUTATIVE S ATOM BRIDGING CYS124 AND FAD. THIS S ATOM IS POSSIBLY CONTRIBUTED BY THE SUBSTRATE OF THE PROTEIN, HYDROGEN SULFIDE. PLEASE REFER TO THE RELATED PUBLICATION FOR A MORE DETAILED DESCRIPTION OF THE PUTATIVE SULFUR LIGANDS OF THE SULFIDE:QUINONE OXIDOREDUCTASE.
解像度: 2.3→50 Å / Num. obs: 135807 / % possible obs: 97.9 % / 冗長度: 3.47 % / Net I/σ(I): 14.87
反射 シェル
解像度: 2.3→2.4 Å / 冗長度: 2.47 % / Mean I/σ(I) obs: 3.44 / % possible all: 87.9
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解析
ソフトウェア
名称
バージョン
分類
XDS
データスケーリング
SHARP
位相決定
REFMAC
5.2.0019
精密化
XDS
データ削減
XSCALE
データスケーリング
精密化
構造決定の手法: 多重同系置換・異常分散 / 解像度: 2.3→20.04 Å / Cor.coef. Fo:Fc: 0.95 / Cor.coef. Fo:Fc free: 0.926 / SU B: 13.13 / SU ML: 0.165 / 交差検証法: THROUGHOUT / ESU R: 0.322 / ESU R Free: 0.226 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.23537
6821
5 %
RANDOM
Rwork
0.19321
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-
-
obs
0.19534
128783
97.94 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK