ENGINEERED RESIDUE IN CHAIN A, TYR 71 TO PHE ENGINEERED RESIDUE IN CHAIN B, TYR 71 TO PHE
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.8 Å3/Da / 溶媒含有率: 56 % / 解説: NONE
結晶化
温度: 293 K / 手法: 蒸気拡散法, ハンギングドロップ法 / pH: 8 詳細: CRYSTALS WERE GROWN AT 277 AND 293 K USING THE HANGING DROP VAPOR DIFFUSION METHOD. THE BEST CRYSTALS WERE OBTAINED BY MIXING 2 UL OF THE PROTEIN SOLUTION (18-20 MG/ML) CONTAINING 50 MM K- ...詳細: CRYSTALS WERE GROWN AT 277 AND 293 K USING THE HANGING DROP VAPOR DIFFUSION METHOD. THE BEST CRYSTALS WERE OBTAINED BY MIXING 2 UL OF THE PROTEIN SOLUTION (18-20 MG/ML) CONTAINING 50 MM K-PHOSPHATE PH 8.0, 0.5 MM PLP, 1 MM DDT WITH AN EQUAL VOLUME OF THE RESERVOIR SOLUTION CONTAINING 50 MM TRIETHANOLAMINE BUFFER (PH 8.0), 0.5 MM PLP, 2 MM DDT, 0.4 M KCL, AND 35-38% (W/V) POLY(ETHYLENE GLYCOL) 5000 MONOMETHYL ETHER. COMPLEX OF Y71F TPL WITH 3-FLUORO-L-TYROSINE WAS PREPARED BY SOAKING CRYSTALS IN THE STABILIZING SOLUTION CONTAINING 10 MM 3- FLUORO-L-TYROSINE FOR ABOUT 30 SECONDS.
解像度: 2.04→98.06 Å / Cor.coef. Fo:Fc: 0.965 / Cor.coef. Fo:Fc free: 0.94 / SU B: 7.459 / SU ML: 0.102 / 交差検証法: THROUGHOUT / ESU R: 0.158 / ESU R Free: 0.148 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. RESIDUE A 600 IS DISORDERED AND FOUND IN TWO CONFORMATIONS. A MAJOR PROPORTION OF ACTIVE SITE A IS OCCUPIED BY THE QUINONOID MOLECULE IN THE ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. RESIDUE A 600 IS DISORDERED AND FOUND IN TWO CONFORMATIONS. A MAJOR PROPORTION OF ACTIVE SITE A IS OCCUPIED BY THE QUINONOID MOLECULE IN THE TENSE STATE WITH OCCUPANCY ESTIMATED AT 0.67. THE RESIDUAL ELECTRON DENSITY SUGGESTS THAT A MINOR POPULATION OF SUBUNIT A IS IN THE OPEN CONFORMATION. DUE TO THE UNCONNECTED PEAKS IN THE ELECTRON DENSITY MAPS AND THE LOW OCCUPANCY, IT WAS NOT POSSIBLE TO MODEL THIS OPEN CONFORMATION. THE ELECTRON DENSITY IN THE ACTIVE SITE OF SUBUNIT A INDICATES THAT APART FROM THE TENSE QUINONOID THERE IS AN ADDITIONAL CHEMICAL SPECIES. THE RESIDUAL ELECTRON DENSITY IS BEST FITTED BY RELAXED QUINONOID MODELED WITH THE ESTIMATED OCCUPANCY OF 0.33 IN THE SAME GEOMETRY AS IN THE OPEN ACTIVE SITE B
Rfactor
反射数
%反射
Selection details
Rfree
0.20886
1047
1.5 %
RANDOM
Rwork
0.16339
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obs
0.16405
70272
95.67 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK