ENGINEERED RESIDUE IN CHAIN A, GLU 192 TO ASN ENGINEERED RESIDUE IN CHAIN B, GLU 192 TO ASN ...ENGINEERED RESIDUE IN CHAIN A, GLU 192 TO ASN ENGINEERED RESIDUE IN CHAIN B, GLU 192 TO ASN ENGINEERED RESIDUE IN CHAIN C, GLU 192 TO ASN ENGINEERED RESIDUE IN CHAIN D, GLU 192 TO ASN
配列の詳細
ALTERNATE LOCI RESULTS IN FOLLOWING DIFFERENCES, T84 IN P0A6L4 IS S84 HERE, G70 IN P0A6L4 IS A70 ...ALTERNATE LOCI RESULTS IN FOLLOWING DIFFERENCES, T84 IN P0A6L4 IS S84 HERE, G70 IN P0A6L4 IS A70 HERE, Q282 IN P0A6L4 IS L282 HERE.
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.4 Å3/Da / 溶媒含有率: 48.71 % / 解説: NONE
結晶化
pH: 8.2 / 詳細: 100 MM TRIS-HCL PH 8.2, 200 MM NACL, 18% PEG 3350
解像度: 1.8→39.95 Å / Cor.coef. Fo:Fc: 0.951 / Cor.coef. Fo:Fc free: 0.922 / SU B: 3.887 / SU ML: 0.108 / 交差検証法: THROUGHOUT / ESU R: 0.029 / ESU R Free: 0.03 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. U VALUES REFINED INDIVIDUALLY
Rfactor
反射数
%反射
Selection details
Rfree
0.25312
5446
4.9 %
RANDOM
Rwork
0.1966
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obs
0.19928
105488
97.54 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK