endo-1,4-beta-xylanase / endo-1,4-beta-xylanase activity / xylan catabolic process / extracellular region 類似検索 - 分子機能
Glycoside hydrolase family 11/12, catalytic domain / Glycoside hydrolase family 11, active site 2 / Glycosyl hydrolases family 11 (GH11) active site signature 2. / Glycoside hydrolase family 11, active site 1 / Glycosyl hydrolases family 11 (GH11) active site signature 1. / Glycoside hydrolase family 11 / Glycosyl hydrolases family 11 (GH11) domain / Glycosyl hydrolases family 11 / Glycosyl hydrolases family 11 (GH11) domain profile. / Glycoside hydrolase family 11/12 ...Glycoside hydrolase family 11/12, catalytic domain / Glycoside hydrolase family 11, active site 2 / Glycosyl hydrolases family 11 (GH11) active site signature 2. / Glycoside hydrolase family 11, active site 1 / Glycosyl hydrolases family 11 (GH11) active site signature 1. / Glycoside hydrolase family 11 / Glycosyl hydrolases family 11 (GH11) domain / Glycosyl hydrolases family 11 / Glycosyl hydrolases family 11 (GH11) domain profile. / Glycoside hydrolase family 11/12 / Concanavalin A-like lectin/glucanase domain superfamily / Jelly Rolls / Sandwich / Mainly Beta 類似検索 - ドメイン・相同性
4beta-beta-xylobiose / Endo-1,4-beta-xylanase A 類似検索 - 構成要素
THE AUTHORS BELIEVE THAT THESE RESIDUES ARE CORRECT AND CONFIRM THAT THE ELECTRON DENSITY SHOWS ...THE AUTHORS BELIEVE THAT THESE RESIDUES ARE CORRECT AND CONFIRM THAT THE ELECTRON DENSITY SHOWS CLEAR EVIDENCE FOR THESE RESIDUES.
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.73 Å3/Da / 溶媒含有率: 54.96 %
結晶化
温度: 277 K / 手法: 蒸気拡散法, ハンギングドロップ法 / pH: 7.5 詳細: 1.6M ammonium sulphate, 0.1M HEPES pH 7.5, 0.1 M sodium chloride, VAPOR DIFFUSION, HANGING DROP, temperature 277K
解像度: 2.8→19.48 Å / Cor.coef. Fo:Fc: 0.904 / Cor.coef. Fo:Fc free: 0.852 / SU B: 32.331 / SU ML: 0.294 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R Free: 0.433 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.27678
542
9.4 %
RANDOM
Rwork
0.2212
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obs
0.22632
5219
97.31 %
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all
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5220
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK