SEQUENCE THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS ...SEQUENCE THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY A GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE.
解像度: 2→69.5 Å / Num. obs: 53921 / % possible obs: 91.6 % / 冗長度: 3.2 % / Rmerge(I) obs: 0.067 / Net I/σ(I): 9.53
反射 シェル
Diffraction-ID: 1
解像度 (Å)
% possible obs (%)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
% possible all
2-2.07
79.6
0.424
2.05
10419
8517
79.6
2.07-2.15
85
0.599
2.73
10995
8992
2.15-2.25
87.7
0.599
3.42
12002
9794
2.25-2.37
90.5
0.599
4.37
12170
9971
2.37-2.52
91.4
0.599
5.39
12343
10138
2.52-2.71
93.1
0.599
6.81
12114
9964
2.71-2.99
94.2
0.599
9.6
12711
10484
2.99-3.42
96.7
0.599
14.04
21791
10512
3.42-4.3
98.4
0.599
17.82
33399
10680
4.3-69.5
98.7
0.599
25.04
33563
10852
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.2.0005
精密化
XSCALE
データスケーリング
PDB_EXTRACT
1.601
データ抽出
XDS
データ削減
SHELX
位相決定
SHARP
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 2→69.5 Å / Cor.coef. Fo:Fc: 0.965 / Cor.coef. Fo:Fc free: 0.94 / SU B: 8.233 / SU ML: 0.124 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R: 0.172 / ESU R Free: 0.161 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 TO ACCOUNT FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 3. ADP AND MG WERE MODELED BASED ON ELECTRON DENSITY AND THE PROTEIN'S PROPOSED FUNCTION AS AN ATPASE. 4. RESIDUES 115-119 ARE DISORDERED IN EACH CHAIN AND WERE NOT MODELED.
Rfactor
反射数
%反射
Selection details
Rfree
0.226
2733
5.1 %
RANDOM
Rwork
0.174
-
-
-
all
0.177
-
-
-
obs
0.17656
51161
97.51 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK