SHEET DETERMINATION METHOD: DSSP THE SHEETS PRESENTED AS "AB" IN EACH CHAIN ON SHEET RECORDS BELOW ... SHEET DETERMINATION METHOD: DSSP THE SHEETS PRESENTED AS "AB" IN EACH CHAIN ON SHEET RECORDS BELOW IS ACTUALLY AN 8-STRANDED BARREL THIS IS REPRESENTED BY A 9-STRANDED SHEET IN WHICH THE FIRST AND LAST STRANDS ARE IDENTICAL. THE SHEETS PRESENTED AS "BB" IN EACH CHAIN ON SHEET RECORDS BELOW IS ACTUALLY AN 8-STRANDED BARREL THIS IS REPRESENTED BY A 9-STRANDED SHEET IN WHICH THE FIRST AND LAST STRANDS ARE IDENTICAL. THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN THE SHEET RECORDS BELOW, TWO SHEETS ARE DEFINED.
RESIDUES IN DISORDERED C TERMINUS MODELLED AS POLYALANINE CHAINS C AND D ARE THE UNKNOWN RESIDUES ...RESIDUES IN DISORDERED C TERMINUS MODELLED AS POLYALANINE CHAINS C AND D ARE THE UNKNOWN RESIDUES OF THE C TERMINUS OF CHAINS A AND B
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.9393 Å / 相対比: 1
反射
解像度: 1.85→30 Å / Num. obs: 135175 / % possible obs: 97 % / Observed criterion σ(I): 0 / 冗長度: 3.9 % / Rmerge(I) obs: 0.09 / Net I/σ(I): 13
反射 シェル
解像度: 1.85→1.95 Å / 冗長度: 3.8 % / Rmerge(I) obs: 0.49 / Mean I/σ(I) obs: 3 / % possible all: 96
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解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.2.0005
精密化
MOSFLM
データ削減
SCALA
データスケーリング
精密化
構造決定の手法: OTHER / 解像度: 1.85→37.74 Å / Cor.coef. Fo:Fc: 0.951 / Cor.coef. Fo:Fc free: 0.927 / SU B: 2.913 / SU ML: 0.088 / 交差検証法: THROUGHOUT / ESU R: 0.125 / ESU R Free: 0.124 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. FOLLOWING POST PROOF-SETTING REVISIONS INFORMED BY THE ANALYSIS PROVIDED BY THE PDB, THE STATISTICS OF THE ACTUALLY COORDINATE FILE ARE ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. FOLLOWING POST PROOF-SETTING REVISIONS INFORMED BY THE ANALYSIS PROVIDED BY THE PDB, THE STATISTICS OF THE ACTUALLY COORDINATE FILE ARE SLIGHTLY DIFFERENT TO THAT REPORTED IN THE PUBLICATION.
Rfactor
反射数
%反射
Selection details
Rfree
0.22
7154
5 %
RANDOM
Rwork
0.18
-
-
-
obs
0.182
135175
96.4 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK