ENGINEERED RESIDUE IN CHAIN A, LEU 10 TO GLN ENGINEERED RESIDUE IN CHAIN A, ASP 160 TO ASN ...ENGINEERED RESIDUE IN CHAIN A, LEU 10 TO GLN ENGINEERED RESIDUE IN CHAIN A, ASP 160 TO ASN ENGINEERED RESIDUE IN CHAIN A, LEU 200 TO PHE ENGINEERED RESIDUE IN CHAIN B, LEU 10 TO GLN ENGINEERED RESIDUE IN CHAIN B, ASP 160 TO ASN ENGINEERED RESIDUE IN CHAIN B, LEU 200 TO PHE ENGINEERED RESIDUE IN CHAIN C, LEU 10 TO GLN ENGINEERED RESIDUE IN CHAIN C, ASP 160 TO ASN ENGINEERED RESIDUE IN CHAIN C, LEU 200 TO PHE ENGINEERED RESIDUE IN CHAIN D, LEU 10 TO GLN ENGINEERED RESIDUE IN CHAIN D, ASP 160 TO ASN ENGINEERED RESIDUE IN CHAIN D, LEU 200 TO PHE ENGINEERED RESIDUE IN CHAIN E, LEU 10 TO GLN ENGINEERED RESIDUE IN CHAIN E, ASP 160 TO ASN ENGINEERED RESIDUE IN CHAIN E, LEU 200 TO PHE ENGINEERED RESIDUE IN CHAIN F, LEU 10 TO GLN ENGINEERED RESIDUE IN CHAIN F, ASP 160 TO ASN ENGINEERED RESIDUE IN CHAIN F, LEU 200 TO PHE
解像度: 2.94→55.05 Å / Cor.coef. Fo:Fc: 0.908 / Cor.coef. Fo:Fc free: 0.835 / SU B: 24.988 / SU ML: 0.437 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R Free: 0.568 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.329
1885
5 %
RANDOM
Rwork
0.264
-
-
-
obs
0.267
35606
98.6 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: BABINET MODEL WITH MASK