解像度: 2.05→49.69 Å / Num. obs: 45533 / % possible obs: 98.2 % / 冗長度: 4.6 % / Biso Wilson estimate: 27.8 Å2 / Rmerge(I) obs: 0.077 / Rsym value: 0.077 / Net I/σ(I): 6.6
反射 シェル
Diffraction-ID: 1
解像度 (Å)
% possible obs (%)
冗長度 (%)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Rsym value
% possible all
2.05-2.16
89.9
2.8
0.381
1.9
5987
0.381
89.9
2.16-2.29
98.2
3.9
0.331
1.4
6230
0.331
2.29-2.45
100
5.1
0.202
3.5
5961
0.202
2.45-2.65
100
5.1
0.137
5.1
5587
0.137
2.65-2.9
100
5.1
0.095
7
5140
0.095
2.9-3.24
100
5.1
0.081
7.1
4661
0.081
3.24-3.74
100
5
0.066
8.6
4147
0.066
3.74-4.58
100
5
0.049
11.6
3515
0.049
4.58-6.48
99.9
4.9
0.046
11
2753
0.046
6.48-49.69
97.9
4.6
0.04
12.4
1552
0.04
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.2.0005
精密化
SCALA
データスケーリング
PDB_EXTRACT
1.601
データ抽出
MOSFLM
データ削減
CCP4
(SCALA)
データスケーリング
SnB
位相決定
MLPHARE
位相決定
CCP4
位相決定
SOLVE
位相決定
SHARP
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 2.05→48.63 Å / Cor.coef. Fo:Fc: 0.96 / Cor.coef. Fo:Fc free: 0.936 / SU B: 10.753 / SU ML: 0.147 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R: 0.179 / ESU R Free: 0.167 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. THE NI SITES WERE ASSIGNED BASED ON ANOMALOUS PEAK HEIGHT, GEOMETRY, AND B-FACTORS. OTHER METALS COULD BE BOUND BUT NI IS MOST PROBABLE. THE ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. THE NI SITES WERE ASSIGNED BASED ON ANOMALOUS PEAK HEIGHT, GEOMETRY, AND B-FACTORS. OTHER METALS COULD BE BOUND BUT NI IS MOST PROBABLE. THE ASSIGNMENT OF CA SITES 7 AND 9 IS BASED ON GEOMETRY, B-FACTOR, AND ANOMALOUS DIFFERENCE FOURIER PEAK HEIGHT. CA SITE 8 AND 10 WERE ASSIGNED BASED ON A SIMILAR ANOMALOUS PEAK HEIGHT AND B-FACTOR. SITE 8 COULD ALSO BE ANOTHER METAL (ZN OR NI) AT LOWER OCCUPANCY. MISSING RESIDUES in Chain A ARE 210-216 AND 332-339, WHILE MISSING RESIDUES IN Chain B ARE 211-216 AND 332-339
Rfactor
反射数
%反射
Selection details
Rfree
0.23
1069
2.3 %
RANDOM
Rwork
0.176
-
-
-
all
0.177
-
-
-
obs
0.177
44437
98.07 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: BABINET MODEL WITH MASK