解像度: 1.6→20 Å / Isotropic thermal model: Isotropic / 交差検証法: THROUGHOUT / σ(F): 0 / 立体化学のターゲット値: REFMAC library 詳細: Scaling details: Babinet's principle for scaling has been used. Bulk solvent correction based on constant value has been used. Parameters for mask calculation. VDW prob radii = 1.40, ION ...詳細: Scaling details: Babinet's principle for scaling has been used. Bulk solvent correction based on constant value has been used. Parameters for mask calculation. VDW prob radii = 1.40, ION probe radii = 0.80, Shrinkage radii = 0.80
Rfactor
反射数
%反射
Selection details
Rfree
0.18279
2623
4.1 %
RANDOM
Rwork
0.14676
-
-
-
all
0.1418
64743
-
-
obs
0.14816
62069
90.3 %
-
溶媒の処理
溶媒モデル: bulk solvent correction
原子変位パラメータ
Biso mean: 18.828 Å2
Baniso -1
Baniso -2
Baniso -3
1-
-0.48 Å2
0 Å2
0.26 Å2
2-
-
-0.36 Å2
0 Å2
3-
-
-
0.87 Å2
精密化ステップ
サイクル: LAST / 解像度: 1.6→20 Å
タンパク質
核酸
リガンド
溶媒
全体
原子数
3956
0
1
773
4730
拘束条件
Refine-ID
タイプ
Dev ideal
Dev ideal target
X-RAY DIFFRACTION
p_bond_d
0.013
0.022
X-RAY DIFFRACTION
p_angle_d
1.399
1.994
X-RAY DIFFRACTION
p_mcbond_it
2.003
1.5
X-RAY DIFFRACTION
p_mcangle_it
3.286
2
X-RAY DIFFRACTION
p_scbond_it
4.845
3
X-RAY DIFFRACTION
p_scangle_it
8.113
4.5
ソフトウェア
*PLUS
名称: REFMAC / 分類: refinement
精密化
*PLUS
最高解像度: 1.6 Å / 最低解像度: 20 Å / σ(F): 0 / % reflection Rfree: 4.1 %