Software Name : REFMAC / Version : 5.8.0403 / Classification : refinementEM software ID Name Category 2 EPUimage acquisition4 GctfCTF correction10 cryoSPARCinitial Euler assignment11 cryoSPARCfinal Euler assignment
CTF correction Type : PHASE FLIPPING AND AMPLITUDE CORRECTIONParticle selection Num. of particles selected : 100075 Symmetry Point symmetry : C4 (4 fold cyclic)3D reconstruction Resolution : 3.7 Å / Resolution method : FSC 0.143 CUT-OFF / Num. of particles : 83845 / Num. of class averages : 6 / Symmetry type : POINTAtomic model building Space : RECIPROCALRefinement Resolution : 3.7→3.7 Å / Cor.coef. Fo :Fc : 0.905 / SU B : 23.466 / SU ML : 0.354 / ESU R : 0.371 Stereochemistry target values : MAXIMUM LIKELIHOOD WITH PHASESDetails : HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONSRfactor Num. reflection % reflection Rwork 0.35826 - - obs 0.35826 28598 100 %
Solvent computation Solvent model : PARAMETERS FOR MASK CACLULATIONDisplacement parameters Biso mean : 167.337 Å2 Refinement step Cycle : 1 / Total : 1855 Refine LS restraints Show large table (5 x 38) Hide large table Refine-ID Type Dev ideal Dev ideal target Number ELECTRON MICROSCOPYr_bond_refined_d0.006 0.011 1913 ELECTRON MICROSCOPYr_bond_other_d0 0.016 1820 ELECTRON MICROSCOPYr_angle_refined_deg1.525 1.618 2610 ELECTRON MICROSCOPYr_angle_other_deg0.585 1.564 4154 ELECTRON MICROSCOPYr_dihedral_angle_1_deg6.43 5 243 ELECTRON MICROSCOPYr_dihedral_angle_2_deg5.8 5 3 ELECTRON MICROSCOPYr_dihedral_angle_3_deg16.076 10 255 ELECTRON MICROSCOPYr_dihedral_angle_4_degELECTRON MICROSCOPYr_chiral_restr0.069 0.2 289 ELECTRON MICROSCOPYr_gen_planes_refined0.007 0.02 2201 ELECTRON MICROSCOPYr_gen_planes_other0.003 0.02 469 ELECTRON MICROSCOPYr_nbd_refinedELECTRON MICROSCOPYr_nbd_otherELECTRON MICROSCOPYr_nbtor_refinedELECTRON MICROSCOPYr_nbtor_otherELECTRON MICROSCOPYr_xyhbond_nbd_refinedELECTRON MICROSCOPYr_xyhbond_nbd_otherELECTRON MICROSCOPYr_metal_ion_refinedELECTRON MICROSCOPYr_metal_ion_otherELECTRON MICROSCOPYr_symmetry_vdw_refinedELECTRON MICROSCOPY