- PDB-7fwf: Crystal Structure of human FABP4 binding site mutated to that of ... -
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基本情報
登録情報
データベース: PDB / ID: 7fwf
タイトル
Crystal Structure of human FABP4 binding site mutated to that of FABP5 in complex with 5-cyclohexyl-6-(2,2,2-trifluoroethoxy)-2-(trifluoromethyl)pyridine-3-carboxylic acid, i.e. SMILES c1(c(nc(c(c1)C(=O)O)C(F)(F)F)OCC(F)(F)F)C1CCCCC1 with IC50=0.733066 microM
要素
Fatty acid-binding protein, adipocyte
キーワード
LIPID BINDING PROTEIN / FATTY ACID BINDING PROTEIN / CYTOPLASM / LIPID-BINDING / TRANSPORT / PROTEIN BINDING
機能・相同性
機能・相同性情報
hormone receptor binding / long-chain fatty acid transmembrane transporter activity / long-chain fatty acid binding / cellular response to lithium ion / Triglyceride catabolism / white fat cell differentiation / long-chain fatty acid transport / fatty acid transport / brown fat cell differentiation / lipid droplet ...hormone receptor binding / long-chain fatty acid transmembrane transporter activity / long-chain fatty acid binding / cellular response to lithium ion / Triglyceride catabolism / white fat cell differentiation / long-chain fatty acid transport / fatty acid transport / brown fat cell differentiation / lipid droplet / cholesterol homeostasis / fatty acid binding / response to bacterium / Transcriptional regulation of white adipocyte differentiation / positive regulation of inflammatory response / cellular response to tumor necrosis factor / positive regulation of cold-induced thermogenesis / MLL4 and MLL3 complexes regulate expression of PPARG target genes in adipogenesis and hepatic steatosis / negative regulation of DNA-templated transcription / extracellular exosome / nucleus / cytosol / cytoplasm 類似検索 - 分子機能
構造決定の手法: 分子置換 開始モデル: inhouse model 解像度: 1.24→36.08 Å / Cor.coef. Fo:Fc: 0.977 / Cor.coef. Fo:Fc free: 0.967 / SU B: 1.423 / SU ML: 0.028 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.043 / ESU R Free: 0.046 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: cyclohexyl has larger aniso displacements in fabp5 than in fabp4
Rfactor
反射数
%反射
Selection details
Rfree
0.1799
1705
5.1 %
RANDOM
Rwork
0.1364
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obs
0.1386
31860
94.59 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK