ENGINEERED RESIDUE IN CHAIN A, THR 335 TO ALA ENGINEERED RESIDUE IN CHAIN A, PHE 336 TO MET ...ENGINEERED RESIDUE IN CHAIN A, THR 335 TO ALA ENGINEERED RESIDUE IN CHAIN A, PHE 336 TO MET ENGINEERED RESIDUE IN CHAIN A, ASN 338 TO GLN ENGINEERED RESIDUE IN CHAIN A, ILE 341 TO VAL ENGINEERED RESIDUE IN CHAIN A, LEU 409 TO PHE ENGINEERED RESIDUE IN CHAIN C, THR 335 TO ALA ENGINEERED RESIDUE IN CHAIN C, PHE 336 TO MET ENGINEERED RESIDUE IN CHAIN C, ASN 338 TO GLN ENGINEERED RESIDUE IN CHAIN C, ILE 341 TO VAL ENGINEERED RESIDUE IN CHAIN C, LEU 409 TO PHE ENGINEERED RESIDUE IN CHAIN E, THR 335 TO ALA ENGINEERED RESIDUE IN CHAIN E, PHE 336 TO MET ENGINEERED RESIDUE IN CHAIN E, ASN 338 TO GLN ENGINEERED RESIDUE IN CHAIN E, ILE 341 TO VAL ENGINEERED RESIDUE IN CHAIN E, LEU 409 TO PHE ENGINEERED RESIDUE IN CHAIN G, THR 335 TO ALA ENGINEERED RESIDUE IN CHAIN G, PHE 336 TO MET ENGINEERED RESIDUE IN CHAIN G, ASN 338 TO GLN ENGINEERED RESIDUE IN CHAIN G, ILE 341 TO VAL ENGINEERED RESIDUE IN CHAIN G, LEU 409 TO PHE ENGINEERED RESIDUE IN CHAIN I, THR 335 TO ALA ENGINEERED RESIDUE IN CHAIN I, PHE 336 TO MET ENGINEERED RESIDUE IN CHAIN I, ASN 338 TO GLN ENGINEERED RESIDUE IN CHAIN I, ILE 341 TO VAL ENGINEERED RESIDUE IN CHAIN I, LEU 409 TO PHE ENGINEERED RESIDUE IN CHAIN K, THR 335 TO ALA ENGINEERED RESIDUE IN CHAIN K, PHE 336 TO MET ENGINEERED RESIDUE IN CHAIN K, ASN 338 TO GLN ENGINEERED RESIDUE IN CHAIN K, ILE 341 TO VAL ENGINEERED RESIDUE IN CHAIN K, LEU 409 TO PHE
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.22 Å3/Da / 溶媒含有率: 44.72 % / 解説: NONE
結晶化
pH: 6 / 詳細: PEG 5000, PIPES PH 6.0
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データ収集
回折
平均測定温度: 100 K
放射光源
由来: シンクロトロン / サイト: APS / ビームライン: 22-ID / 波長: 0.9
検出器
タイプ: MARRESEARCH / 検出器: CCD / 日付: 2005年7月21日
放射
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.9 Å / 相対比: 1
反射
解像度: 2.6→100 Å / Num. obs: 97588 / % possible obs: 80 % / Observed criterion σ(I): 1.5 / 冗長度: 3.1 % / Biso Wilson estimate: 45.3 Å2 / Rmerge(I) obs: 0.14 / Net I/σ(I): 11.9
反射 シェル
解像度: 2.6→2.69 Å / 冗長度: 1.6 % / Rmerge(I) obs: 0.51 / Mean I/σ(I) obs: 1.5 / % possible all: 49.4
解像度: 2.6→137.36 Å / Cor.coef. Fo:Fc: 0.934 / Cor.coef. Fo:Fc free: 0.88 / SU B: 35.906 / SU ML: 0.372 / 交差検証法: THROUGHOUT / ESU R: 0.23 / ESU R Free: 0.448 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.28023
4927
5.1 %
RANDOM
Rwork
0.21493
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obs
0.2182
92527
77.71 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK