+Open data
-Basic information
Entry | Database: EMDB / ID: EMD-31752 | |||||||||
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Title | Negative-staining map of T4 DNA ligase-AMP Binary Complex IV | |||||||||
Map data | T4 DNA ligase conformation Open III | |||||||||
Sample |
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Keywords | Ligase / DNA Repair / DNA replication / DNA BINDING PROTEIN | |||||||||
Biological species | bacteriophage T (virus) | |||||||||
Method | single particle reconstruction / negative staining / Resolution: 12.9 Å | |||||||||
Authors | Zhang L / Li N | |||||||||
Funding support | China, 1 items
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Citation | Journal: To Be Published Title: Repair of DNA nick by T4 DNA ligase in three parallel pathways Authors: Zhang L / Li N | |||||||||
History |
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-Structure visualization
Supplemental images |
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-Downloads & links
-EMDB archive
Map data | emd_31752.map.gz | 1.8 MB | EMDB map data format | |
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Header (meta data) | emd-31752-v30.xml emd-31752.xml | 11.2 KB 11.2 KB | Display Display | EMDB header |
FSC (resolution estimation) | emd_31752_fsc.xml | 3 KB | Display | FSC data file |
Images | emd_31752.png | 29.8 KB | ||
Archive directory | http://ftp.pdbj.org/pub/emdb/structures/EMD-31752 ftp://ftp.pdbj.org/pub/emdb/structures/EMD-31752 | HTTPS FTP |
-Validation report
Summary document | emd_31752_validation.pdf.gz | 426.8 KB | Display | EMDB validaton report |
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Full document | emd_31752_full_validation.pdf.gz | 426.4 KB | Display | |
Data in XML | emd_31752_validation.xml.gz | 7 KB | Display | |
Data in CIF | emd_31752_validation.cif.gz | 8.5 KB | Display | |
Arichive directory | https://ftp.pdbj.org/pub/emdb/validation_reports/EMD-31752 ftp://ftp.pdbj.org/pub/emdb/validation_reports/EMD-31752 | HTTPS FTP |
-Related structure data
-Links
EMDB pages | EMDB (EBI/PDBe) / EMDataResource |
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-Map
File | Download / File: emd_31752.map.gz / Format: CCP4 / Size: 2 MB / Type: IMAGE STORED AS FLOATING POINT NUMBER (4 BYTES) | ||||||||||||||||||||||||||||||||||||
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Annotation | T4 DNA ligase conformation Open III | ||||||||||||||||||||||||||||||||||||
Projections & slices | Image control
Images are generated by Spider. | ||||||||||||||||||||||||||||||||||||
Voxel size | X=Y=Z: 1.607 Å | ||||||||||||||||||||||||||||||||||||
Density |
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Symmetry | Space group: 1 | ||||||||||||||||||||||||||||||||||||
Details | EMDB XML:
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-Supplemental data
-Sample components
-Entire : T4 DNA ligase conformation Open III
Entire | Name: T4 DNA ligase conformation Open III |
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Components |
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-Supramolecule #1: T4 DNA ligase conformation Open III
Supramolecule | Name: T4 DNA ligase conformation Open III / type: complex / ID: 1 / Parent: 0 |
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Source (natural) | Organism: bacteriophage T (virus) |
Molecular weight | Theoretical: 55 KDa |
-Experimental details
-Structure determination
Method | negative staining |
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Processing | single particle reconstruction |
Aggregation state | particle |
-Sample preparation
Concentration | 0.017 mg/mL | ||||||||||||||||||
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Buffer | pH: 7.5 Component:
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Staining | Type: NEGATIVE / Material: Uranyl Acetate Details: A 4.0 uL drop of the sample was placed on a glow-discharged EM specimen grid (CF200-Cu, Electron Microscopy Sciences, Hatfield, PA, USA) with a thin carbon film for 1 min and the excess ...Details: A 4.0 uL drop of the sample was placed on a glow-discharged EM specimen grid (CF200-Cu, Electron Microscopy Sciences, Hatfield, PA, USA) with a thin carbon film for 1 min and the excess solution was blotted with filter paper. Then, the grid was washed with a clean drop (~35 uL/drop) of water and stained two times with two drops (~25 uL/drop) of 2% (w/v) uranyl acetate (UA) for 10 s, 30 s respectively before air-drying. | ||||||||||||||||||
Grid | Model: C-flat / Material: COPPER / Mesh: 200 / Support film - Material: CARBON / Support film - topology: CONTINUOUS / Support film - Film thickness: 3 / Pretreatment - Type: GLOW DISCHARGE / Pretreatment - Time: 10 sec. / Pretreatment - Atmosphere: AIR / Pretreatment - Pressure: 0.038 kPa |
-Electron microscopy
Microscope | TFS TALOS F200C |
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Image recording | Film or detector model: FEI CETA (4k x 4k) / Digitization - Dimensions - Width: 4096 pixel / Digitization - Dimensions - Height: 4096 pixel / Number real images: 67 / Average exposure time: 1.0 sec. / Average electron dose: 160.0 e/Å2 |
Electron beam | Acceleration voltage: 200 kV / Electron source: FIELD EMISSION GUN |
Electron optics | Illumination mode: FLOOD BEAM / Imaging mode: BRIGHT FIELD / Cs: 2.7 mm |
Experimental equipment | Model: Tecnai F20 / Image courtesy: FEI Company |