温度: 298 K / 手法: 蒸気拡散法, シッティングドロップ法 詳細: CRYSTALLIZATION TRIALS WERE PERFORMED AT 18 C BY THE SITTING DROP VAPOUR DIFFUSION METHOD. CRYSTALS GROWN BY MIXING 1 UL OF FC-SIAL (9 MG/ML IN PBS) WITH 3 UL OF PRECIPITANT SOLUTION ...詳細: CRYSTALLIZATION TRIALS WERE PERFORMED AT 18 C BY THE SITTING DROP VAPOUR DIFFUSION METHOD. CRYSTALS GROWN BY MIXING 1 UL OF FC-SIAL (9 MG/ML IN PBS) WITH 3 UL OF PRECIPITANT SOLUTION CONSISTING OF 0.1M HEPES PH7, 16% PEG 6000, VAPOR DIFFUSION, TEMPERATURE 298K
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.99 Å / 相対比: 1
反射
解像度: 2.3→20.1 Å / Num. obs: 24279 / % possible obs: 100 % / Observed criterion σ(I): 2 / 冗長度: 6.4 % / Rmerge(I) obs: 0.09 / Net I/σ(I): 11.7
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解析
ソフトウェア
名称: REFMAC / バージョン: 5.7.0029 / 分類: 精密化
精密化
構造決定の手法: その他 開始モデル: NONE 解像度: 2.3→20.1 Å / Cor.coef. Fo:Fc: 0.923 / Cor.coef. Fo:Fc free: 0.887 / SU B: 8.002 / SU ML: 0.194 / 交差検証法: THROUGHOUT / ESU R: 0.333 / ESU R Free: 0.255 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.28215
1300
5.1 %
RANDOM
Rwork
0.23398
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obs
0.23647
24279
99.96 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK