タイプ: DECTRIS EIGER X 9M / 検出器: PIXEL / 日付: 2022年6月14日 詳細: white beam slits, a double crystal Si(111) monochromator with horizontal axis, tandem flat beam deflecting mirrors (Pd coating), and Kirkpatrick-Baez focusing mirrors, which are Pd coated and ...詳細: white beam slits, a double crystal Si(111) monochromator with horizontal axis, tandem flat beam deflecting mirrors (Pd coating), and Kirkpatrick-Baez focusing mirrors, which are Pd coated and able to bend adaptively using 16 piezo actuators. Each optical element is preceded by slits and its transmitted beam is monitored by beam position monitors or retractable screens
放射
モノクロメーター: Si(111) / プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.9201 Å / 相対比: 1
反射
解像度: 2.24→41.07 Å / Num. obs: 52302 / % possible obs: 98.5 % / 冗長度: 3.9 % / Biso Wilson estimate: 53.02 Å2 / CC1/2: 0.982 / Rpim(I) all: 0.14 / Net I/σ(I): 3.9
反射 シェル
解像度: 2.24→2.3 Å / 冗長度: 4 % / Mean I/σ(I) obs: 1.1 / Num. unique obs: 3801 / CC1/2: 0.142 / Rpim(I) all: 1.152 / % possible all: 97.7