- PDB-7g1e: Crystal Structure of human FABP4 in complex with 3-[(2-phenylphen... -
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基本情報
登録情報
データベース: PDB / ID: 7g1e
タイトル
Crystal Structure of human FABP4 in complex with 3-[(2-phenylphenoxy)methyl]benzoic acid, i.e. SMILES c1cc(c(cc1)OCc1cccc(c1)C(=O)O)c1ccccc1 with IC50=0.915 microM
要素
Fatty acid-binding protein, adipocyte
キーワード
LIPID BINDING PROTEIN / FATTY ACID BINDING PROTEIN / CYTOPLASM / LIPID-BINDING / TRANSPORT / PROTEIN BINDING
機能・相同性
機能・相同性情報
white fat cell proliferation / hormone receptor binding / long-chain fatty acid transmembrane transporter activity / long-chain fatty acid binding / cellular response to lithium ion / Triglyceride catabolism / white fat cell differentiation / long-chain fatty acid transport / fatty acid transport / lipid droplet ...white fat cell proliferation / hormone receptor binding / long-chain fatty acid transmembrane transporter activity / long-chain fatty acid binding / cellular response to lithium ion / Triglyceride catabolism / white fat cell differentiation / long-chain fatty acid transport / fatty acid transport / lipid droplet / brown fat cell differentiation / cholesterol homeostasis / fatty acid binding / response to bacterium / Transcriptional regulation of white adipocyte differentiation / cellular response to tumor necrosis factor / positive regulation of inflammatory response / positive regulation of cold-induced thermogenesis / MLL4 and MLL3 complexes regulate expression of PPARG target genes in adipogenesis and hepatic steatosis / negative regulation of DNA-templated transcription / extracellular exosome / nucleus / cytoplasm / cytosol 類似検索 - 分子機能
構造決定の手法: 分子置換 開始モデル: inhouse model 解像度: 1.21→43.77 Å / Cor.coef. Fo:Fc: 0.973 / Cor.coef. Fo:Fc free: 0.967 / SU B: 2.032 / SU ML: 0.038 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.044 / ESU R Free: 0.046 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: benzoic acid moiety not well defined by electron density possibly radiation damage-induced decarboxylation N-terminus multiply disordered
Rfactor
反射数
%反射
Selection details
Rfree
0.2011
1976
5.1 %
RANDOM
Rwork
0.1604
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obs
0.1624
36830
94.75 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK