histone H3K9me/H3K9me2 demethylase activity / [histone H3]-dimethyl-L-lysine9 demethylase / antioxidant activity / histone H3K9 demethylase activity / histone deacetylase complex / transcription coregulator activity / HDMs demethylate histones / chromatin DNA binding / chromatin / regulation of transcription by RNA polymerase II ...histone H3K9me/H3K9me2 demethylase activity / [histone H3]-dimethyl-L-lysine9 demethylase / antioxidant activity / histone H3K9 demethylase activity / histone deacetylase complex / transcription coregulator activity / HDMs demethylate histones / chromatin DNA binding / chromatin / regulation of transcription by RNA polymerase II / nucleoplasm / metal ion binding 類似検索 - 分子機能
: / Lysine-specific demethylase 3B, PWWP domain / Domain of unknown function (DUF7030) / Histone demethylase JHDM2-like / Lysine-specific demethylase 3B, tudor domain / Cupin / JmjC domain, hydroxylase / A domain family that is part of the cupin metalloenzyme superfamily. / JmjC domain / JmjC domain profile. ...: / Lysine-specific demethylase 3B, PWWP domain / Domain of unknown function (DUF7030) / Histone demethylase JHDM2-like / Lysine-specific demethylase 3B, tudor domain / Cupin / JmjC domain, hydroxylase / A domain family that is part of the cupin metalloenzyme superfamily. / JmjC domain / JmjC domain profile. / Jelly Rolls / Sandwich / Mainly Beta 類似検索 - ドメイン・相同性
PanDDA analysis group deposition of Human JMJD1B screened against the DSPL Fragment Library
タイプ
changed state
解説
Jmjc Domain of Human JMJD1B screened against the DSPL Fragment Library by X-ray Crystallography at the XChem facility of Diamond Light Source beamline I04-1
解像度: 1.9→54.99 Å / Cor.coef. Fo:Fc: 0.965 / Cor.coef. Fo:Fc free: 0.948 / SU B: 4.698 / SU ML: 0.124 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.138 / ESU R Free: 0.132 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS U VALUES : REFINED INDIVIDUALLY
Rfactor
反射数
%反射
Selection details
Rfree
0.2194
3669
5 %
RANDOM
Rwork
0.1802
-
-
-
obs
0.1822
70067
99.04 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK