Crystal structure of Staphylococcal nuclease variant Delta+PHS I92K at cryogenic temperature
要素
Thermonuclease
キーワード
HYDROLASE / nuclease / hyperstable / pdTp / ionizable group
機能・相同性
機能・相同性情報
micrococcal nuclease / endonuclease activity, active with either ribo- or deoxyribonucleic acids and producing 3'-phosphomonoesters / nucleic acid binding / extracellular region / membrane / metal ion binding 類似検索 - 分子機能
OB fold (Dihydrolipoamide Acetyltransferase, E2P) - #90 / Thermonuclease family signature 1. / Thermonuclease active site / Thermonuclease family signature 2. / Staphylococcal nuclease (SNase-like), OB-fold / Staphylococcal nuclease homologue / Thermonuclease domain profile. / Staphylococcal nuclease homologues / SNase-like, OB-fold superfamily / OB fold (Dihydrolipoamide Acetyltransferase, E2P) ...OB fold (Dihydrolipoamide Acetyltransferase, E2P) - #90 / Thermonuclease family signature 1. / Thermonuclease active site / Thermonuclease family signature 2. / Staphylococcal nuclease (SNase-like), OB-fold / Staphylococcal nuclease homologue / Thermonuclease domain profile. / Staphylococcal nuclease homologues / SNase-like, OB-fold superfamily / OB fold (Dihydrolipoamide Acetyltransferase, E2P) / Beta Barrel / Mainly Beta 類似検索 - ドメイン・相同性
モノクロメーター: double crystal Si(111) with cryogenically-cooled first crystal and sagittally-bent second crystal horizontally-focusing at 3.3:1 demagnification プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
解像度: 1.75→38.11 Å / Cor.coef. Fo:Fc: 0.962 / Cor.coef. Fo:Fc free: 0.944 / WRfactor Rfree: 0.241 / WRfactor Rwork: 0.2025 / FOM work R set: 0.8586 / SU B: 4.078 / SU ML: 0.075 / SU R Cruickshank DPI: 0.1216 / SU Rfree: 0.1175 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.122 / ESU R Free: 0.117 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN USED IF PRESENT IN THE INPUT U VALUES : WITH TLS ADDED
Rfactor
反射数
%反射
Selection details
Rfree
0.2239
735
5.1 %
RANDOM
Rwork
0.1872
-
-
-
obs
0.1892
13551
97.64 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK