解像度: 1.8→28.202 Å / Num. obs: 24327 / % possible obs: 97.7 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 22.035 Å2 / Rmerge(I) obs: 0.056 / Net I/σ(I): 10.16
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
1.8-1.86
0.605
1.5
7837
4184
1
95.8
1.86-1.94
0.433
2
9446
4952
1
99
1.94-2.03
0.301
2.9
8990
4718
1
99.1
2.03-2.13
0.21
4.2
8274
4330
1
98.9
2.13-2.27
0.137
6.2
9147
4784
1
98.4
2.27-2.44
0.102
7.9
8558
4460
1
98.6
2.44-2.69
0.081
9.8
8956
4661
1
98.1
2.69-3.07
0.057
13.6
8642
4491
1
97.7
3.07-3.87
0.03
22.7
8609
4484
1
96
3.87-28.2
0.021
31.4
8702
4483
1
95.1
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
MolProbity
3beta29
モデル構築
PDB_EXTRACT
3.1
データ抽出
SHELX
位相決定
SHARP
位相決定
XSCALE
January30, 2009
データスケーリング
REFMAC
5.7.0032
精密化
XDS
データ削減
SHELXD
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 1.78→28.202 Å / Cor.coef. Fo:Fc: 0.949 / Cor.coef. Fo:Fc free: 0.93 / Occupancy max: 1 / Occupancy min: 0.5 / SU B: 4.006 / SU ML: 0.067 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.027 / ESU R Free: 0.027 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: 1. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED ...詳細: 1. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 2. ATOM RECORD CONTAINS SUM OF TLS AND RESIDUAL B FACTORS. ANISOU RECORD CONTAINS SUM OF TLS AND RESIDUAL U FACTORS. 3. MAGNESIUM (MG), CHLORIDE (CL), AND POLYETHYLENE GLYCOL 200 FRAGMENTS (PG4 AND PGE) FROM THE CRYSTALLIZATION/CRYO CONDITIONS ARE MODELED INTO THE STRUCTURE. 4. THE DIFFRACTION DATA ARE PSEUDO-MEROHEDRALLY TWINNED WITH TWIN LAW (-H, L, K). THE REFINED TWIN FRACTION WAS 0.30. 6. REFLECTIONS FOR THE FREE-R SET WERE SELECTED BY RANDOM EXPANDED BY THE TWIN LAW. 7. NCS RESTRAINTS WERE APPLIED USING REFMAC'S LOCAL NCS OPT
Rfactor
反射数
%反射
Selection details
Rfree
0.238
1230
5.1 %
RANDOM
Rwork
0.1935
-
-
-
obs
0.1956
24325
96.09 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: BABINET MODEL WITH MASK