HELIX DETERMINATION METHOD: DSSP OUTPUT MODIFIED BY AUTHOR
Remark 700
SHEET DETERMINATION METHOD: DSSP THE SHEETS PRESENTED AS "AD" IN EACH CHAIN ON SHEET RECORDS BELOW ... SHEET DETERMINATION METHOD: DSSP THE SHEETS PRESENTED AS "AD" IN EACH CHAIN ON SHEET RECORDS BELOW IS ACTUALLY AN 8-STRANDED BARREL THIS IS REPRESENTED BY A 9-STRANDED SHEET IN WHICH THE FIRST AND LAST STRANDS ARE IDENTICAL.
N-ACETYL-D-GLUCOSAMINE (NAG): THE LAST 3 NUMBERS MATCH THE ASN RESIDUE THEY ARE LINKED TO. THE ...N-ACETYL-D-GLUCOSAMINE (NAG): THE LAST 3 NUMBERS MATCH THE ASN RESIDUE THEY ARE LINKED TO. THE GLYCANS ARE THEN NUMBERED ACCORDING TO THEIR POSITION DISTANT FROM THE ATTACHED ASN.
配列の詳細
TWO DIFFERENT START SITES ARE PRESENT IN MOUSE GALC, WE HAVE USED THE SECOND START SITE (TO MATCH ...TWO DIFFERENT START SITES ARE PRESENT IN MOUSE GALC, WE HAVE USED THE SECOND START SITE (TO MATCH THE LITERATURE) WHICH IS M17 IN THE UNIPROT ENTRY. THE FULL CONSTRUCT CONTAINS A SECRETION TAG (THAT IS CLEAVED) A HIS TAG AND A FACTOR XA SITE WHICH ARE NOT.
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 3.04 Å3/Da / 溶媒含有率: 59.52 % / 解説: NONE
結晶化
pH: 6.8 詳細: 0.2 M SODIUM ACETATE, 0.1 M SODIUM CACODYLATE, PH 6.8, 34% (W/V) POLYETHYLENE GLYCOL 8000.
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.98 Å / 相対比: 1
反射
解像度: 2.1→73.23 Å / Num. obs: 53657 / % possible obs: 99.6 % / Observed criterion σ(I): -3 / 冗長度: 3.7 % / Biso Wilson estimate: 27.18 Å2 / Rmerge(I) obs: 0.12 / Net I/σ(I): 7
反射 シェル
解像度: 2.1→2.15 Å / 冗長度: 3.7 % / Rmerge(I) obs: 0.7 / Mean I/σ(I) obs: 1.7 / % possible all: 99.8
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解析
ソフトウェア
名称
バージョン
分類
PHENIX
(PHENIX.REFINE)
精密化
MOSFLM
データ削減
SCALA
データスケーリング
PHENIX
位相決定
精密化
構造決定の手法: 多重同系置換・異常分散 開始モデル: NONE 解像度: 2.1→63.182 Å / SU ML: 0.61 / σ(F): 0.88 / 位相誤差: 20.44 / 立体化学のターゲット値: ML 詳細: THE NUMBERS OF REFLECTIONS IN THE TWO TABLES ABOVE (FIT TO DATA USED IN REFINEMENT AND FIT TO DATA USED IN REFINEMENT (IN BINS)) ARE FOR THE DATA BEFORE MERGING OF ANOMALOUS PAIRS.
Rfactor
反射数
%反射
Rfree
0.2142
5056
5.1 %
Rwork
0.1812
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obs
0.1828
53619
99.45 %
溶媒の処理
減衰半径: 0.83 Å / VDWプローブ半径: 1.1 Å / 溶媒モデル: FLAT BULK SOLVENT MODEL / Bsol: 31.577 Å2 / ksol: 0.331 e/Å3