E178Q IS AN ACTIVE SITE MUTATION. AMINO ACID SEQUENCE CORRESPONDING TO RESIDUES 1-1245 IN UNIPROT ...E178Q IS AN ACTIVE SITE MUTATION. AMINO ACID SEQUENCE CORRESPONDING TO RESIDUES 1-1245 IN UNIPROT DATABASE ENTRY Q6CJ09, PLUS A C-TERMINAL EXPRESSION TAG (RESIDUES 1246-1253), WAS USED FOR CRYSTALLIZATION. MOST OF THE RESIDUES FROM RESIDUE 463 TO 503, AND FROM RESIDUE 984 TO 1082 WERE MISSING IN THE COORDINATES DUE TO LACK OF ELECTRON DENSITY. SEVERAL RESIDUES WITHIN THESE RANGES WERE MODELED AS POLY-ALA SEGMENTS, AND ARE REPRESENTED AS UNK RESIDUES 469-487 AND 1038-1052 OF CHAIN A, UNK RESIDUES 469-487 AND 1036-1052 OF CHAIN B, UNK RESIDUES 469-487 AND 1038-1054 OF CHAIN C, AND UNK RESIDUES 469-487 OF CHAIN D. THESE RESIDUE NUMBERS ARE ARBITRARILY ASSIGNED. IT IS EXPECTED THAT RESIDUES 469-487 BELONG TO THE 463-503 SEGMENT, AND RESIDUES 1036-1054 BELONG TO THE 984-1082 SEGMENT.
構造決定の手法: 分子置換 / 解像度: 2.9→30 Å / Cor.coef. Fo:Fc: 0.909 / Cor.coef. Fo:Fc free: 0.857 / SU B: 41.844 / SU ML: 0.36 / 交差検証法: THROUGHOUT / ESU R Free: 0.437 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.30476
7790
5 %
RANDOM
Rwork
0.24125
-
-
-
obs
0.24441
146829
97.22 %
-
all
-
151028
-
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK