モノクロメーター: Single crystal Si(111) bent monochromator (horizontal focusing) プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.97889 Å / 相対比: 1
反射
解像度: 2.2→29.728 Å / Num. obs: 46149 / % possible obs: 99.8 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 39.231 Å2 / Rmerge(I) obs: 0.085 / Net I/σ(I): 12.71
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
2.2-2.28
0.826
1.9
33580
8829
1
99.8
2.28-2.37
0.684
2.2
32950
8583
1
99.9
2.37-2.48
0.521
2.9
34101
8865
1
99.9
2.48-2.61
0.399
3.7
33346
8648
1
99.8
2.61-2.77
0.292
5.2
33065
8560
1
99.8
2.77-2.98
0.189
7.6
33255
8594
1
99.9
2.98-3.28
0.105
12.8
33888
8751
1
99.9
3.28-3.76
0.057
21.2
34379
8859
1
99.9
3.76-4.72
0.036
31.5
33536
8649
1
99.8
4.72-29.728
0.029
37.8
34155
8817
1
99.4
-
位相決定
位相決定
手法: 単波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
SOLVE
位相決定
REFMAC
5.5.0110
精密化
XSCALE
データスケーリング
PDB_EXTRACT
3.1
データ抽出
XDS
データ削減
精密化
構造決定の手法: 単波長異常分散 / 解像度: 2.2→29.728 Å / Cor.coef. Fo:Fc: 0.959 / Cor.coef. Fo:Fc free: 0.947 / Occupancy max: 1 / Occupancy min: 0.3 / SU B: 8.277 / SU ML: 0.11 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.185 / ESU R Free: 0.157 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. ATOM RECORD CONTAINS SUM OF TLS AND RESIDUAL B FACTORS. 3. ANISOU RECORD CONTAINS SUM OF TLS AND RESIDUAL U FACTORS. 4. WATERS WERE ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. ATOM RECORD CONTAINS SUM OF TLS AND RESIDUAL B FACTORS. 3. ANISOU RECORD CONTAINS SUM OF TLS AND RESIDUAL U FACTORS. 4. WATERS WERE EXCLUDED FROM AUTOMATIC TLS ASSIGNMENT. 5. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 6. GLYCEROL (GOL) AND SULFATE MOLECULES FROM THE CRYSTALLIZATION SOLUTION ARE MODELED.
Rfactor
反射数
%反射
Selection details
Rfree
0.2023
2331
5.1 %
RANDOM
Rwork
0.173
-
-
-
obs
0.1745
46089
99.89 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: BABINET MODEL WITH MASK