THE PROTEIN WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV ...THE PROTEIN WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY A GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE.
解像度: 2→29.136 Å / Num. obs: 50053 / % possible obs: 98.5 % / Observed criterion σ(I): -3 / 冗長度: 3.6 % / Biso Wilson estimate: 26.518 Å2 / Rmerge(I) obs: 0.061 / Net I/σ(I): 10.69
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
2-2.07
0.507
1.7
17004
8924
1
95.2
2.07-2.15
0.386
2.2
17591
9194
1
99
2.15-2.25
0.296
2.9
18759
9754
1
98.9
2.25-2.37
0.221
3.8
18410
9586
1
98.6
2.37-2.52
0.166
4.9
18485
9588
1
99.3
2.52-2.71
0.126
6.4
18011
9310
1
98.7
2.71-2.99
0.082
9.6
18833
9724
1
98.9
2.99-3.42
0.049
15.4
18288
9401
1
99
3.42-4.3
0.028
25.6
18306
9406
1
98.7
4.3-29.136
0.019
34
18560
9492
1
98.1
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.5.0053
精密化
PHENIX
精密化
SHELX
位相決定
MolProbity
3beta29
モデル構築
XSCALE
データスケーリング
PDB_EXTRACT
3.006
データ抽出
XDS
データ削減
SHELXD
位相決定
autoSHARP
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 2→29.136 Å / Cor.coef. Fo:Fc: 0.961 / Cor.coef. Fo:Fc free: 0.943 / Occupancy max: 1 / Occupancy min: 0.25 / SU B: 7.145 / SU ML: 0.09 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.147 / ESU R Free: 0.137 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1.HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2.ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 3.A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN ...詳細: 1.HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2.ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 3.A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 4.CITRATE (CIT) AND GLYCEROL (GOL) FROM THE CRYSTALLIZATION AND CRYOPROTECTION CONDITIONS RESPECTIVELY HAVE BEEN MODELED IN THE SOLVENT STRUCTURE.
Rfactor
反射数
%反射
Selection details
Rfree
0.203
2540
5.1 %
RANDOM
Rwork
0.165
-
-
-
obs
0.167
49992
99.48 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK