ENGINEERED RESIDUE IN CHAIN A, LYS 33 TO ALA ENGINEERED RESIDUE IN CHAIN A, TRP 39 TO ALA ...ENGINEERED RESIDUE IN CHAIN A, LYS 33 TO ALA ENGINEERED RESIDUE IN CHAIN A, TRP 39 TO ALA ENGINEERED RESIDUE IN CHAIN A, PHE 40 TO SER ENGINEERED RESIDUE IN CHAIN A, GLU 43 TO GLN ENGINEERED RESIDUE IN CHAIN A, CYS 87 TO SER ENGINEERED RESIDUE IN CHAIN A, ASP 113 TO ASN ENGINEERED RESIDUE IN CHAIN A, MET 131 TO GLU ENGINEERED RESIDUE IN CHAIN A, ASN 200 TO GLU ENGINEERED RESIDUE IN CHAIN A, LEU 321 TO CYS ENGINEERED RESIDUE IN CHAIN B, LYS 33 TO ALA ENGINEERED RESIDUE IN CHAIN B, TRP 39 TO ALA ENGINEERED RESIDUE IN CHAIN B, PHE 40 TO SER ENGINEERED RESIDUE IN CHAIN B, GLU 43 TO GLN ENGINEERED RESIDUE IN CHAIN B, CYS 87 TO SER ENGINEERED RESIDUE IN CHAIN B, ASP 113 TO ASN ENGINEERED RESIDUE IN CHAIN B, MET 131 TO GLU ENGINEERED RESIDUE IN CHAIN B, ASN 200 TO GLU ENGINEERED RESIDUE IN CHAIN B, LEU 321 TO CYS
解像度: 2.2→37.96 Å / Cor.coef. Fo:Fc: 0.942 / Cor.coef. Fo:Fc free: 0.904 / SU B: 6.494 / SU ML: 0.164 / 交差検証法: THROUGHOUT / σ(F): 2 / ESU R: 0.237 / ESU R Free: 0.216 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.27159
2093
5 %
RANDOM
Rwork
0.20994
-
-
-
obs
0.21301
39440
99.84 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK