SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN ... SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN THE SHEET RECORDS BELOW, TWO SHEETS ARE DEFINED.
ENGINEERED RESIDUE IN CHAIN A, ASP 473 TO GLU ENGINEERED RESIDUE IN CHAIN B, ASP 473 TO GLU ...ENGINEERED RESIDUE IN CHAIN A, ASP 473 TO GLU ENGINEERED RESIDUE IN CHAIN B, ASP 473 TO GLU ENGINEERED RESIDUE IN CHAIN C, ASP 473 TO GLU ENGINEERED RESIDUE IN CHAIN D, ASP 473 TO GLU ENGINEERED RESIDUE IN CHAIN E, ASP 473 TO GLU ENGINEERED RESIDUE IN CHAIN F, ASP 473 TO GLU ENGINEERED RESIDUE IN CHAIN G, ASP 473 TO GLU ENGINEERED RESIDUE IN CHAIN H, ASP 473 TO GLU
配列の詳細
THE UNIPROT DATABASE ENTRY FOR THIS SEQUENCE (P00877) HAS A VARIANT (LEU46PRO) WHICH OCCURS IN ...THE UNIPROT DATABASE ENTRY FOR THIS SEQUENCE (P00877) HAS A VARIANT (LEU46PRO) WHICH OCCURS IN STRAIN 21GR AND 2137.
-
実験情報
-
実験
実験
手法: X線回折 / 使用した結晶の数: 1
-
試料調製
結晶
マシュー密度: 2.44 Å3/Da / 溶媒含有率: 49.28 % / 解説: NONE
結晶化
pH: 7.5 / 詳細: pH 7.5
-
データ収集
回折
平均測定温度: 100 K
放射光源
由来: シンクロトロン / サイト: MAX II / ビームライン: I711 / 波長: 1.0917
検出器
タイプ: MARRESEARCH / 検出器: CCD / 日付: 2004年6月15日
放射
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 1.0917 Å / 相対比: 1
反射
解像度: 2.8→20 Å / Num. obs: 125065 / % possible obs: 98.4 % / 冗長度: 7.9 % / Rmerge(I) obs: 0.09 / Net I/σ(I): 11.9
反射 シェル
解像度: 2.8→2.9 Å / Rmerge(I) obs: 0.63 / % possible all: 98.6
解像度: 2.8→20 Å / Cor.coef. Fo:Fc: 0.947 / Cor.coef. Fo:Fc free: 0.929 / SU B: 15.453 / SU ML: 0.298 / 交差検証法: THROUGHOUT / ESU R Free: 0.373 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. VERY WEAK DENSITIES WERE OBSERVED FOR SOME RESIDUE SIDE CHAINS. RESIDUES ARG84, MET87 ARG130, ASN136 AND LYS137 OF THE SMALL SUBUNIT WERE ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. VERY WEAK DENSITIES WERE OBSERVED FOR SOME RESIDUE SIDE CHAINS. RESIDUES ARG84, MET87 ARG130, ASN136 AND LYS137 OF THE SMALL SUBUNIT WERE THUS MODELED ON EXISTING HIGH RESOLUTION STRUCTURES AND HAVE HIGH B FACTORS.
Rfactor
反射数
%反射
Selection details
Rfree
0.228
6228
5 %
RANDOM
Rwork
0.197
-
-
-
obs
0.198
118598
98.4 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK