5'-flap endonuclease activity / DNA replication, removal of RNA primer / 5'-3' exonuclease activity / leading strand elongation / DNA polymerase processivity factor activity / regulation of DNA replication / 加水分解酵素; エステル加水分解酵素 / DNA repair / magnesium ion binding / DNA binding 類似検索 - 分子機能
SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN ... SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN THE SHEET RECORDS BELOW, TWO SHEETS ARE DEFINED.
CHAIN A: ENDONUCLEASE THAT CLEAVES THE 5' OVERHANGING FLAP STRUCTURE THAT IS GENERATED BY ...CHAIN A: ENDONUCLEASE THAT CLEAVES THE 5' OVERHANGING FLAP STRUCTURE THAT IS GENERATED BY DISPLACEMENT SYNTHESIS WHEN DNA POLYMERASE ENCOUNTERS THE 5' END OF A DOWNSTREAM OKAZAKI FRAGMENT. CHAIN B: SLIDING CLAMP SUBUNIT. CHAIN C: SLIDING CLAMP SUBUNIT. RESPONSIBLE FOR TETHERING THE CATALYTIC SUBUNIT OF DNA POLYMERASE TO DNA DURING HIGH-SPEED REPLICATION.
配列の詳細
FIRST FOUR RESIDUES REMOVED FOR CONSTRUCT
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.45 Å3/Da / 溶媒含有率: 50 %
結晶化
手法: 蒸気拡散法, ハンギングドロップ法 詳細: PRIOR TO CRYSTALLISATION THE PCNA1-PCNA2-PCNA3 COMPLEX WAS MIXED WITH FEN1 AT AN EQUIMOLAR RATIO AND INCUBATED FOR 20 MIN AT 294 K. PCNA1-PCNA2-FEN1 CO-CRYSTALS WERE GROWN BY THE VAPOUR ...詳細: PRIOR TO CRYSTALLISATION THE PCNA1-PCNA2-PCNA3 COMPLEX WAS MIXED WITH FEN1 AT AN EQUIMOLAR RATIO AND INCUBATED FOR 20 MIN AT 294 K. PCNA1-PCNA2-FEN1 CO-CRYSTALS WERE GROWN BY THE VAPOUR DIFFUSION METHOD IN HANGING DROPS. PCNA3 WAS NOT PRESENT IN THE CRYSTAL LATTICE. DROPS WERE PREPARED BY MIXING 100 MM PROTEIN COMPLEX IN 20 MM TRIS-HCL PH 8.0, 200 MM NACL, 5 MM MGCL2, 2 MM DTT BUFFER SOLUTION WITH EQUAL VOLUMES OF 0.1M ACETATE PH 4.8, 8% PEG 8,000, 220 MM ZNOAC2 AND 30 MM GLYCYL-GLYCYL-GLYCINE.
解像度: 2.9→30 Å / Cor.coef. Fo:Fc: 0.895 / Cor.coef. Fo:Fc free: 0.848 / SU B: 40.663 / SU ML: 0.388 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R Free: 0.497 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.312
1088
5.1 %
RANDOM
Rwork
0.25
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obs
0.253
20108
98.9 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK