SEQUENCE CLONING ARTIFACT: THE CONSTRUCT WAS PCR AMPLIFIED WITH TAQ POLYMERASE. SEQUENCING OF THE ... SEQUENCE CLONING ARTIFACT: THE CONSTRUCT WAS PCR AMPLIFIED WITH TAQ POLYMERASE. SEQUENCING OF THE CLONED CONSTRUCT INDICATED THAT ARG IN POSITION 33 WAS MUTATED TO ALA. HOWEVER, THE LOCATION OF ALA33 WITHIN THE STRUCTURE SUGGESTS THAT A LARGE SIDE CHAIN AT THIS POSITION IS UNLIKELY WITHOUT SIGNIFICANT STRUCTURAL CHANGES.
モノクロメーター: Double Crystal Si(111) / プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 1.11587 Å / 相対比: 1
反射
解像度: 2.2→63.66 Å / Num. obs: 26842 / % possible obs: 100 % / 冗長度: 7.4 % / Biso Wilson estimate: 53.64 Å2 / Rsym value: 0.068 / Net I/σ(I): 13.9
反射 シェル
解像度: 2.2→2.32 Å / 冗長度: 4.7 % / Mean I/σ(I) obs: 2.3 / Num. unique all: 3836 / Rsym value: 0.588 / % possible all: 100
-
解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.2.0001
精密化
SCALA
4.2)
データスケーリング
CNS
精密化
MOSFLM
データ削減
CCP4
(SCALA)
データスケーリング
CNS
位相決定
精密化
構造決定の手法: 分子置換 / 解像度: 2.2→63.66 Å / Cor.coef. Fo:Fc: 0.959 / Cor.coef. Fo:Fc free: 0.936 / SU B: 8.866 / SU ML: 0.116 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R: 0.152 / ESU R Free: 0.144 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: THE METAL SITE COORDINATED BY CYS98, CYS101, CYS116, CYS119 IS TENATIVELY ASSIGNED AS ZINC BASED ON SEQUENCE HOMOLOGY. IT IS CONSISTENT WITH ELECTRON DENSITY AND COORDINATION. OTHER METALS ...詳細: THE METAL SITE COORDINATED BY CYS98, CYS101, CYS116, CYS119 IS TENATIVELY ASSIGNED AS ZINC BASED ON SEQUENCE HOMOLOGY. IT IS CONSISTENT WITH ELECTRON DENSITY AND COORDINATION. OTHER METALS SUCH AS IRON ARE ALSO POSSIBLE. ELECTRON DENSITY AT THE C-TERMINUS IS POOR.
Rfactor
反射数
%反射
Selection details
Rfree
0.21955
1371
5.1 %
RANDOM
Rwork
0.18668
-
-
-
obs
0.18831
25436
99.87 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: BABINET MODEL WITH MASK
原子変位パラメータ
Biso mean: 68.881 Å2
Baniso -1
Baniso -2
Baniso -3
1-
1.85 Å2
0.92 Å2
0 Å2
2-
-
1.85 Å2
0 Å2
3-
-
-
-2.77 Å2
精密化ステップ
サイクル: LAST / 解像度: 2.2→63.66 Å
タンパク質
核酸
リガンド
溶媒
全体
原子数
2053
0
25
96
2174
拘束条件
Refine-ID
タイプ
Dev ideal
Dev ideal target
数
X-RAY DIFFRACTION
r_bond_refined_d
0.017
0.021
2149
X-RAY DIFFRACTION
r_angle_refined_deg
1.509
1.936
2925
X-RAY DIFFRACTION
r_dihedral_angle_1_deg
5.824
5
256
X-RAY DIFFRACTION
r_dihedral_angle_2_deg
34.71
23.524
105
X-RAY DIFFRACTION
r_dihedral_angle_3_deg
14.851
15
351
X-RAY DIFFRACTION
r_dihedral_angle_4_deg
15.135
15
16
X-RAY DIFFRACTION
r_chiral_restr
0.102
0.2
312
X-RAY DIFFRACTION
r_gen_planes_refined
0.006
0.02
1646
X-RAY DIFFRACTION
r_nbd_refined
0.195
0.2
890
X-RAY DIFFRACTION
r_xyhbond_nbd_refined
0.137
0.2
113
X-RAY DIFFRACTION
r_symmetry_vdw_refined
0.201
0.2
62
X-RAY DIFFRACTION
r_symmetry_hbond_refined
0.178
0.2
15
X-RAY DIFFRACTION
r_mcbond_it
2.452
3
1324
X-RAY DIFFRACTION
r_mcangle_it
3.466
5
2074
X-RAY DIFFRACTION
r_scbond_it
6.251
8
963
X-RAY DIFFRACTION
r_scangle_it
7.928
11
851
LS精密化 シェル
解像度: 2.2→2.257 Å / Total num. of bins used: 20
Rfactor
反射数
%反射
Rfree
0.298
113
5.85 %
Rwork
0.25
1818
-
精密化 TLS
手法: refined / Refine-ID: X-RAY DIFFRACTION
ID
L11 (°2)
L12 (°2)
L13 (°2)
L22 (°2)
L23 (°2)
L33 (°2)
S11 (Å °)
S12 (Å °)
S13 (Å °)
S21 (Å °)
S22 (Å °)
S23 (Å °)
S31 (Å °)
S32 (Å °)
S33 (Å °)
T11 (Å2)
T12 (Å2)
T13 (Å2)
T22 (Å2)
T23 (Å2)
T33 (Å2)
Origin x (Å)
Origin y (Å)
Origin z (Å)
1
1.6906
0.7142
1.299
0.6809
1.334
5.579
0.0391
-0.2451
0.0352
0.204
-0.1411
0.0064
0.4056
0.2978
0.1021
-0.1934
-0.1513
-0.0191
-0.025
0.0859
-0.1666
82.035
41.617
8.911
2
2.2156
0.7016
1.6064
2.1159
1.2102
7.2225
-0.3726
0.0564
0.7209
-0.024
-0.1053
0.2295
-1.6316
0.2241
0.478
0.1509
-0.2671
-0.1763
-0.0264
0.1235
0.0588
93.341
68.942
-1.053
精密化 TLSグループ
Refine-ID: X-RAY DIFFRACTION / Selection: ALL / Auth asym-ID: A / Label asym-ID: A