extrachromosomal circular DNA / bacteriocin immunity / toxic substance binding / endonuclease activity / killing of cells of another organism / 加水分解酵素; エステル加水分解酵素 / defense response to bacterium / protein domain specific binding / protein-containing complex / metal ion binding 類似検索 - 分子機能
Colicin E7 immunity protein; Chain B, fragment: Endonuclease domain / Colicin/pyocin, DNase domain / Colicin E immunity protein / Colicin immunity protein/pyocin immunity protein / Colicin E immunity protein superfamily / Colicin immunity protein / pyocin immunity protein / Colicin/Pyocin-S2, DNase domain / Colicin/pyocin, DNase domain superfamily / Colicin, receptor domain / Coiled-coil receptor-binding R-domain of colicin E2 ...Colicin E7 immunity protein; Chain B, fragment: Endonuclease domain / Colicin/pyocin, DNase domain / Colicin E immunity protein / Colicin immunity protein/pyocin immunity protein / Colicin E immunity protein superfamily / Colicin immunity protein / pyocin immunity protein / Colicin/Pyocin-S2, DNase domain / Colicin/pyocin, DNase domain superfamily / Colicin, receptor domain / Coiled-coil receptor-binding R-domain of colicin E2 / Cloacin colicin family / Colicin-like bacteriocin tRNase domain / Pyosin/cloacin translocation domain / Pyosin/cloacin translocation domain superfamily / His-Me finger superfamily / Non-ribosomal Peptide Synthetase Peptidyl Carrier Protein; Chain A / Alpha-Beta Complex / Orthogonal Bundle / Mainly Alpha / Alpha Beta 類似検索 - ドメイン・相同性
硝酸塩 / Colicin-E2 immunity protein / Colicin-E9 類似検索 - 構成要素
ENGINEERED RESIDUE IN CHAIN A, CYS 23 TO ALA ENGINEERED RESIDUE IN CHAIN A, GLU 31 TO CYS ...ENGINEERED RESIDUE IN CHAIN A, CYS 23 TO ALA ENGINEERED RESIDUE IN CHAIN A, GLU 31 TO CYS ENGINEERED RESIDUE IN CHAIN B, GLY 543 TO CYS
解像度: 1.78→19.59 Å / Cor.coef. Fo:Fc: 0.956 / Cor.coef. Fo:Fc free: 0.943 / SU B: 2.101 / SU ML: 0.068 / 交差検証法: THROUGHOUT / ESU R: 0.108 / ESU R Free: 0.106 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. U VALUES REFINED INDIVIDUALLY.
Rfactor
反射数
%反射
Selection details
Rfree
0.22288
1349
5 %
RANDOM
Rwork
0.19285
-
-
-
obs
0.19434
25395
96.39 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK